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A Design Method for Thin Film Patterning Process via Lift-Off Technique

机译：通过剥离技术进行薄膜构图工艺的设计方法

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摘要

Thin film patterning by the lift-off technique is effective from the viewpoint of cost performance and environmental issues. As a solution to problems of conventional lift-off methods, the inversely-tapered resist profile with interstice was proposed and its fundamental feasibility was experimentally proved. The resist profile still needed to be designed properly to solve the problems completely, and hence a design method was also suggested. The method presupposes that conditions of deposition process have been determined in advance. However, actually, the conditions relate closely to the design of the resist profile and improper conditions may result in undesirable or infeasible design result. This paper focuses on deposition rate as one of the conditions, and proposes an integrated design method of the thin film patterning process considering both resist profile and deposition rate.
机译：从成本性能和环境问题的角度来看，通过剥离技术进行的薄膜图案化是有效的。为解决传统剥离方法的问题，提出了一种具有间隙的反锥形抗蚀剂轮廓，并通过实验证明了其基本可行性。仍然需要适当设计抗蚀剂轮廓以完全解决问题，因此还提出了一种设计方法。该方法假设已经预先确定了沉积工艺的条件。然而，实际上，这些条件与抗蚀剂轮廓的设计紧密相关，并且不合适的条件可能导致不期望的或不可行的设计结果。本文以沉积速率为条件之一，提出了同时考虑抗蚀剂轮廓和沉积速率的薄膜构图工艺的集成设计方法。

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  • 来源
  • 会议地点 Hyogo(JP);Hyogo(JP)
  • 作者

    Eiji Morinaga; Yutaka Matsuura; Hidefumi Wakamatsu; Ryohei Satoh; Koji Nakagawa; Yoshiharu lwata; Eiji Arai;

  • 作者单位

    Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;

    Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan,Currently, West Nippon Expressway Company Limited;

    Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;

    Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;

    Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan,Currently, ASAHI GLASS CO., LTD.;

    Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;

    Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    integrated design; deposition; resist profile; lift-off; thin film patterning;

    机译：一体化设计；沉积抗蚀剂轮廓升空;薄膜图案;

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