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Characterization of TMR Head Durability against Lapping Based on Magnetic Performance

机译：基于磁性能的TMR磁头耐研磨性的表征

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Magnetic recording technologies are continuing to advance toward higher areal densities, driven by the availability of tunneling magnetoresistive (TMR) heads. However, high areal density heads require smaller physical dimensions, and this can render TMR heads more vulnerable to mechanical stresses generated during the lapping process. Although is important to verify the durability of TMR heads against lapping, it is very difficult to perform a crystallographic analysis of the affected layer because of the small dimensions involved. In this study, we attempted to establish an advanced TMR head verification method based on a magnetic performance analysis involving micro-Kerr hysteresis loops and the magnetic noise spectrum. We found that the magnetic performance changed when nanoscale scratches were removed from the lapped surface using ion beam etching. This indicates that the lapping process produces an affected layer which deteriorates the magnetic characteristics of the TMR head. A correlation was also found between the change in magnetic performance and the morphology of lapped surface.
机译：在隧道磁阻（TMR）磁头的可用性的推动下，磁记录技术正在不断朝着更高的面密度发展。但是，高面密度的磁头需要较小的物理尺寸，这会使TMR磁头更容易受到研磨过程中产生的机械应力的影响。尽管对于验证TMR磁头的耐磨损性很重要，但由于涉及的尺寸很小，因此很难对受影响的层进行晶体学分析。在这项研究中，我们试图基于磁性能分析（包括微克尔磁滞回线和磁噪声谱）建立先进的TMR磁头验证方法。我们发现，使用离子束刻蚀从研磨表面去除纳米级划痕时，磁性性能发生了变化。这表明研磨过程产生了受影响的层，该层降低了TMR磁头的磁特性。在磁性能的变化和研磨表面的形态之间也发现了相关性。

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