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首页> 外文会议>European Photovoltaic Solar Energy Conference; 20060904-08; Dresden(DE) >FAST AND RELIABLE THICKNESS AND REFRACTIVE INDEX MEASUREMENT OF AR COATINGS ON SOLAR SILICON BY ELLIPSOMETRY
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FAST AND RELIABLE THICKNESS AND REFRACTIVE INDEX MEASUREMENT OF AR COATINGS ON SOLAR SILICON BY ELLIPSOMETRY

机译：椭偏法快速可靠地测定厚度和折射率对硅上AR涂层的折光率

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摘要

The accurate knowledge of thickness and refractive index of AR coatings on solar silicon is one of the key prerequisite for manufacturing of high performance solar cells. In general ellipsometric measurements are most suitable to determine both film thickness and index of refraction because of its fast and contactless optical measuring principle. Unfortunately, the roughness of the surface of textured multicrystalline and monocrystalline silicon solar cells strongly aggravate such measurements or make them even impossible due to their intentionally poor reflectance and scattering characteristics. Recent developments in hard- and software of single wavelength and spectroscopic ellipsometers enable us to obtain stable and accurate results for thickness and refractive index measurements on all types of silicon solar cells. Especially further improvements of the optical setup and the optimization of sample alignment lead to the capability to efficiently collect the low reflected intensities. These achievements culminate in an industry proven solution for in-line and off-line determination of thickness and refractive index of AR coatings even on textured single crystalline silicon substrates.
机译：准确了解太阳能硅上增透膜的厚度和折射率是制造高性能太阳能电池的关键先决条件之一。通常，由于椭圆偏振法的快速和非接触式光学测量原理，因此它最适合于确定膜的厚度和折射率。不幸的是，由于其故意不良的反射率和散射特性，织构化的多晶硅和单晶硅太阳能电池表面的粗糙度极大地加剧了这种测量，或者甚至使它们变得不可能。单波长和光谱椭偏仪的硬件和软件方面的最新发展使我们能够获得所有类型的硅太阳能电池的厚度和折射率测量结果的稳定和准确的结果。尤其是光学设置的进一步改进和样品对准的优化，导致了有效收集低反射强度的能力。这些成就最终形成了业界公认的解决方案，可在线或离线确定AR涂层的厚度和折射率，甚至可以在带纹理的单晶硅基板上进行。

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