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首页> 外文会议>EUV and X-ray optics: Synergy between laboratory and space II >Multilayer-coated micro-grating array for x-ray phase-contrast imaging
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Multilayer-coated micro-grating array for x-ray phase-contrast imaging

机译：用于X射线相衬成像的多层镀膜微光栅阵列

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X-ray imaging techniques based on grating interferometers rely on transmission gratings to detect x-ray refraction and scattering in a sample. Gratings periods below 2 microns are challenging to realize due to the high aspect ratio of the structures. We propose a method to fabricate transmission gratings with sub-micron periods over centimeter areas by multilayer coating of a staircase (echelle) substrate. The advantage of this approach is the high aspect ratio of multilayer coating and the large area of the echelle substrate. The staircase pattern is etched on the surface of a silicon wafer through anisotropic etching. Multiple layers are deposited on the horizontal surfaces of the stairs by magnetron sputtering in a single run. The layers alternate between two materials of different absorption coefficients or refractive indices. The layer thickness d is designed to be (stair height)/2N, where 2N is the total number of layers. The incident xray beam is parallel to the layers and oblique to the wafer surface. Each stair of the echelle substrate forms a micro grating of period 2d, and the array of micro gratings together act as a single grating over a large area given the right continuity conditions. The grating period potentially can be below 100 nm. We present theoretical description of wave diffraction by the grating array, and results of the first fabrication test with magnetron sputtering deposition
机译：基于光栅干涉仪的X射线成像技术依靠透射光栅来检测样品中的X射线折射和散射。由于结构的高纵横比，实现小于2微米的光栅周期具有挑战性。我们提出了一种通过对楼梯（阶梯形）衬底进行多层涂层来制造厘米级以上亚微米周期的透射光栅的方法。这种方法的优点是多层涂层的高纵横比和echelle基板的大面积。通过各向异性蚀刻在硅晶片的表面上蚀刻阶梯图案。在一次运行中通过磁控溅射将多层沉积在楼梯的水平表面上。这些层在具有不同吸收系数或折射率的两种材料之间交替。层厚度d被设计为（台阶高度）/ 2N，其中2N是层的总数。入射的X射线束平行于各层并倾斜于晶片表面。阶梯形基板的每个台阶形成一个周期为2d的微光栅，在正确的连续性条件下，微光栅阵列一起在大面积上充当单个光栅。光栅周期可能低于100 nm。我们介绍了光栅阵列对波衍射的理论描述，以及磁控溅射沉积首次制造测试的结果

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