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Achieving zero stress in iridium, chromium, and nickel thin films

机译：在铱，铬和镍薄膜中实现零应力

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摘要

We examine a method for achieving zero intrinsic stress in thin films of iridium, chromium, and nickel deposited by magnetron sputter deposition. The examination of the stress in these materials is motivated by efforts to advance the optical performance of light-weight x-ray space telescopes into the regime of sub-arc second resolution. A characteristic feature of the intrinsic stress behavior in chromium and nickel is their sensitivity to the magnitude and sign of the intrinsic stress with argon gas pressure, including the existence of a critical pressure that results in zero film stress. This critical pressure scales linearly with the film's density. While the effect of stress reversal with argon pressure has been previously reported by Hoffman and others for nickel and chromium, we have discovered a similar behavior for the intrinsic stress in iridium films. Additionally, we have identified zero stress in iridium shortly after island coalescence in the high adatom mobility growth regime. This feature of film growth is used for achieving a total internal stress of-2.89 MPa for a 15.8 nm thick iridium film with a surface roughness of 5.0 ± 0.5A based on x-ray reflectivity (XRR) measurement at CuKa. The surface topography was also examined using atomic force microscopy (AFM). The examination of the stress in these films has been performed with a novel in-situ measurement device. The methodology and sensitivity of the in-situ instrument is also described herein.
机译：我们研究了一种通过磁控溅射沉积在铱，铬和镍薄膜中实现零固有应力的方法。努力将轻型X射线太空望远镜的光学性能提高到亚弧第二分辨率范围内是对这些材料中应力的检查的动力。铬和镍中固有应力行为的一个特征是，它们对氩气压力下固有应力的大小和符号敏感，包括存在导致零薄膜应力的临界压力。该临界压力与膜的密度成线性比例。尽管霍夫曼等人先前已经报道了用氩气逆转应力对镍和铬的影响，但我们发现铱膜的固有应力具有类似的行为。此外，在高原子迁移率生长机制中的岛合并后不久，我们发现铱中的零应力。基于CuKa的X射线反射率（XRR）测量，该膜生长的特征用于实现15.8 nm厚的铱膜的总内部应力为2.89 MPa，该铱膜的表面粗糙度为5.0±0.5A。还使用原子力显微镜（AFM）检查了表面形貌。这些薄膜中的应力检查已经使用新型的原位测量设备进行了。本文还描述了现场仪器的方法和灵敏度。

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