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Nanoelectromechanics of Piezoresponse Force Microscopy: Contact Properties, Fields Below the Surface and Polarization Switching

机译:压电响应显微镜的纳米机电:接触特性,表面以下的场和极化转换

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To achieve quantitative interpretation of Piezoresponse Force Microscopy (PFM), including resolution limits, tip bias- and strain-induced phenomena and spectroscopy, knowledge of elastic and electrostatic field distributions below the tip is required. The exact closed form solution of the coupled electroelastic problem for piezoelectric indentation is derived and used to obtain the tip-induced electric field and strain distribution in the ferroelectric material. This establishes a complete continuum mechanics description of the PFM imaging mechanism. These solutions are reduced to the point charge/force behavior for large separations from contact, and the applicability limits and charge/force magnitude for these models are established. The implications of these results for ferroelectric polarization switching processes are analyzed.
机译:为了实现压电响应力显微镜(PFM)的定量解释,包括分辨率极限,尖端偏斜和应变引起的现象以及光谱学,需要了解尖端下方的弹性和静电场分布。推导了压电压痕耦合电弹性问题的精确封闭形式解,并将其用于获得铁电材料中的尖端感应电场和应变分布。这建立了对PFM成像机制的完整连续力学描述。这些解决方案简化为点电荷/力行为,以实现较大的接触距离,并确定了这些模型的适用范围和电荷/力的大小。分析了这些结果对铁电极化切换过程的影响。

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