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Pattern tolerance analysis of distorted linear array using interval methods

机译:区间法对变形线性阵列的图案公差进行分析

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A mathematical model is developed to determine the effect on the radiated array pattern of distorted linear array caused by the tolerances on the array element position using the interval methods. In the model, according to the mathematical rules of interval arithmetic, the upper and lower bounds of linear array's power pattern can be analytically expressed as functions of interval values of the element positional errors. The tolerance studies are achieved with the expression to determine the effects of different interval values of the positional errors on the interval of radiated power pattern and its features such as sidelobe levels and beam width as well as pattern tolerance index. A series of representative results demonstrate the validity and potential ability of the proposed model.
机译:建立了一个数学模型,以确定使用间隔方法由对阵列元件位置的公差引起的对扭曲线性阵列的辐射阵列方向图的影响。在该模型中,根据区间算术的数学规则,可以将线性阵列功率图案的上下限解析为元素位置误差的区间值的函数。通过表达式确定容差研究,可以确定位置误差的不同间隔值对辐射功率模式间隔及其特征(如旁瓣电平和波束宽度以及模式容忍度指数)的影响。一系列具有代表性的结果证明了该模型的有效性和潜在能力。

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