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首页> 外文会议>Fifth International Conference on Optical and Photonics Engineering >Spectroscopic imaging ellipsometry for thin film detection on uniaxial crystal
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Spectroscopic imaging ellipsometry for thin film detection on uniaxial crystal

机译：用于单轴晶体薄膜检测的光谱成像椭圆偏振法

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摘要

Spectroscopic imaging ellipsometry (SIE) is a powerful technique devoted to the study of optical properties and thickness of thin films by measuring the change in polarization state of light reflected from the surface. SIE measures two quantities (Ψ and Δ ), which represent the amplitude ratio and phase angle of deflection of the p-polarized light and s-polarized light reflected from the sample surface. The SIE measurement of thin film is difficult when the substrate is uniaxial anisotropic crystal for two reasons - firstly the p-polarized and s-polarized components of reflective light are coupled which makes the data processing more complex and secondly an optical model is needed for SIE data processing with the substrate optical constants as known parameters in the model, but the substrate optical constants are not unique when the plane of the optical axis changes. Hence in the measurement of thin film on an anisotropic material using generalized ellipsometry, significant errors due to the complex calculation arise. The best approach is to measure the uniaxial substrate as an isotropic material by adjusting the optical axis in the incident plane. In this paper, the crystal optical axis is determined by rotating the sample using the SIE setup and the incident light is adjusted in the optical axis plane to eliminate the effects of uniaxial substrate. A uniaxial KDP (Potassium Dihydrogen Phosphate) crystal with thin oil film and a bare KDP substrate are prepared. A scheme to determine KDP crystal optical axis is proposed. Finally, the optical constants of the KDP substrate are determined, and the oil film thickness on KDP crystal is measured when the incident light is in crystal optical axis plane.
机译：光谱椭偏仪（SIE）是一项强大的技术，致力于通过测量从表面反射的光的偏振态的变化来研究薄膜的光学特性和厚度。 SIE测量两个量（Ψ和Δ），它们代表从样品表面反射的p偏振光和s偏振光的振幅比和偏转相位角。当基板是单轴各向异性晶体时，薄膜的SIE测量很困难，原因有两个：首先，反射光的p偏振分量和s偏振分量耦合在一起，这使得数据处理更加复杂；其次，SIE需要光学模型以衬底光学常数作为模型中的已知参数进行数据处理，但是当光轴平面发生变化时，衬底光学常数并不是唯一的。因此，在使用广义椭圆偏光法测量各向异性材料上的薄膜时，由于复杂的计算而产生了明显的误差。最好的方法是通过调整入射平面中的光轴，将单轴基板作为各向同性材料进行测量。在本文中，通过使用SIE装置旋转样品来确定晶体光轴，并在光轴平面中调整入射光以消除单轴基板的影响。制备具有油膜的单轴KDP（磷酸二氢钾）晶体和裸露的KDP基板。提出了确定KDP晶体光轴的方案。最后，确定KDP基板的光学常数，并在入射光在晶体光轴平面中时测量KDP晶体上的油膜厚度。

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  • 来源
  • 会议地点 Singapore(SG)
  • 作者

    Lichao Guan; Jiexiong Ding; Li Du; Achyut Adhikari; Anand Krishna Asundi;

  • 作者单位

    School of Mechatronics Engineering, University of Electronic Science and Technology of China, Chengdu, China, 611731;

    School of Mechatronics Engineering, University of Electronic Science and Technology of China, Chengdu, China, 611731;

    School of Mechatronics Engineering, University of Electronic Science and Technology of China, Chengdu, China, 611731;

    Centre for Optical and Laser Engineering, School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 639798;

    Centre for Optical and Laser Engineering, School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 639798;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Spectroscopic imaging ellipsometry; uniaxial crystal; optical axis; thin film; KDP crystal;

    机译：光谱成像椭圆偏振法；单轴晶体光轴薄膜; KDP水晶;
  • 入库时间 2022-08-26 14:02:07

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