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Efficient Femtosecond Laser Surface Patterning Using High Dielectric Constant Particles with Small Size Parameter

机译:使用小尺寸参数的高介电常数粒子高效飞秒激光表面图案化

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We present results on near-field ablation using Mie resonance high dielectric constant particles with small size parameter for establishing a new downsizing technique for nanopatterning. In this article, we first describe a comparative study of near-field properties on substrates using metallic and dielectric nanoparticle. The results indicate that combination of' particle and substrate for efficient localized near-field nano-processing is important for selecting either metallic or dielectric particle. We then demonstrate nanoablation using a Mie resonance high dielectric constant small particle. Theoretical calculations clarified that the maximal enhancement factor and spot diameter close to the smallest size are obtainable on both low-refractive-index (SiO_2) and high-refractive-index (Si) substrates using a 200 nm Mie resonance dielectric particle (n~2.7) at magnetic quadrupole mode with 400 nm excitation wavelength. Experimental results with 200 nm amorphous TiO_2 particles (n=2.66+0.024i) by 400 nm femtosecond laser irradiation verified that clear circular nanoholes with about 100 nm in diameter were fabricated on both substrates even with laser fluence lower than a half ablation threshold of the bare substrates. As for nanopatterning with two-dimensionally arrayed 200 nm amorphous TiO_2 particles, cohesion of nanoholes was observed in high laser fluence regime due to inter-particle near-field interaction.
机译:我们提出了使用具有小尺寸参数的Mie共振高介电常数粒子进行近场消融的结果,以建立一种新的缩小尺寸的纳米图案化技术。在本文中,我们首先描述了使用金属和介电纳米粒子在基板上进行近场特性的比较研究。结果表明,颗粒和基底的结合对于有效的局部近场纳米处理是重要的,对于选择金属或电介质颗粒都是重要的。然后,我们证明了使用Mie共振高介电常数小颗粒的纳米烧蚀。理论计算表明,使用200 nm Mie共振介电粒子(n〜2.7),在低折射率(SiO_2)和高折射率(Si)衬底上均可获得最大增强因子和接近最小尺寸的光斑直径。 )在400 nm激发波长的磁性四极模式下。用400 nm飞秒激光辐照200 nm无定形TiO_2颗粒(n = 2.66 + 0.024i)的实验结果证明,即使激光通量低于其半融化阈值,在两个基板上都可以制造出直径约为100 nm的透明圆形纳米孔。裸露的基材。至于二维排列的200 nm无定形TiO_2颗粒的纳米图案,由于粒子间的近场相互作用,在高激光注量状态下观察到了纳米孔的内聚。

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