Vacuum ultraviolet argon excimer laser at 126 nm excited by a high intensity laser

著录项

• 来源
  《Gas flow, chemical lasers, and high-power lasers》|2010年|p.775113.1-775113.6|共6页
• 会议地点 Sofia(BG);Sofia(BG)
• 作者

  Masanori Kaku; Shinya Harano; Masahito Katto; Shoichi Kubodera;

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• 作者单位

  Department of Electrical and Electronic Engineering and Photon Science Center,University of Miyazaki, Gakuen Kibanadai Nishi 1-1, Miyazaki, 889-2192, Japan;

  Department of Electrical and Electronic Engineering and Photon Science Center,University of Miyazaki, Gakuen Kibanadai Nishi 1-1, Miyazaki, 889-2192, Japan;

  Cooperative Research Center, University of Miyazaki, Gakuen Kibanadai Nishi 1-1,Miyazaki, 889-2192, Japan;

  Department of Electrical and Electronic Engineering and Photon Science Center,University of Miyazaki, Gakuen Kibanadai Nishi 1-1, Miyazaki, 889-2192, Japan;

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• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类 激光技术、微波激射技术;
• 关键词

  VUV laser; high intensity laser; excimer laser; OFI plasma;

  机译：VUV激光;高强度激光准分子激光OFI血浆;