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Nano-Surface Patterning by Femtosecond Laser for Plasmonic Surface Optical Applications

机译:飞秒激光在等离子表面光学应用中的纳米表面图案化

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For plasmonic surface optical applications, localized optical field distribution properties in the vicinity of gold particles on a silicon substrate by backward and forward irradiation are presented. It is technically difficult to fabricate nanostructure on the surface by conventional forward laser incidence to the substrate because gold nanoparticles easily aggregate to form double-layered particle arrays. We calculated enhanced optical field properties in order to pattern the substrate surface only with a template of the bottom-layered particle arrays in case that the backward irradiation of femtosecond laser is used in the system of aggregated double-layered gold nanoparticle arrays. With the backward irradiation, the optical field intensity in the substrate for the double-layered hexagonal arrays is found to be only 30% lower than the mono-layered system. Moreover, near-field cannot be generated with the forward irradiation. As a result, only the backward irradiation scheme is found to be effective for uniform surface nanopatterning at enhanced plasmonic near-field zones.
机译:对于等离子表面光学应用,提出了通过向后和向前照射在硅衬底上金颗粒附近的局部光场分布特性。由于金纳米颗粒容易聚集形成双层颗粒阵列,因此通过常规的正向激光入射到基底上在表面上制造纳米结构在技术上是困难的。我们计算了增强的光场属性,以便在聚集的双层金纳米颗粒阵列系统中使用飞秒激光的反向照射时,仅使用底层颗粒阵列的模板对基板表面进行图案化。通过向后照射,发现双层六边形阵列的基板中的光场强度仅比单层系统低30%。而且,前向照射不能产生近场。结果,发现仅向后照射方案对于增强的等离子体近场区处的均匀表面纳米图案有效。

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