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首页> 外文会议>General society student poster session >Electrochemical Performance and Chemical Stability of Architecturally Designed La_(2-x) Pr_xNiO_(4+δ) IT-SOFC Cathodes
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Electrochemical Performance and Chemical Stability of Architecturally Designed La_(2-x) Pr_xNiO_(4+δ) IT-SOFC Cathodes

机译：建筑设计的La_（2-x）Pr_xNiO_（4 +δ）IT-SOFC阴极的电化学性能和化学稳定性

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摘要

In this work, La_(2-x)Pr_xNiO_(4+δ) (with x=0.0, 0.5, 1 and 2) films have been prepared and studied with the aim of determining the best compromise between stability and electrochemical properties. Indeed La_2NiO_(4+δ) is known to exhibit a higher chemical stability while Pr_2NiO_(4+δ) presents better electrochemical properties. The properties of mixed phases were found intermediate between those of Pr_2NiO_(4+δ) and La_2NiO_(4+δ). The chemical stability decreases by increasing the Pr content. Furthermore, novel double layer La_(2-x)Pr_xNiO_(4+δ) cathodes were designed by electrostatic spray deposition followed by screen-printing. The polarization resistance (R_(pol)) of a double layer LaPrNiO_(4+δ) cathode was found equal to 0.11 Ω cm~2 at 600 ℃, which is the lowest value available in the literature for this composition.
机译：在这项工作中，La_（2-x）Pr_xNiO_（4 +δ）（x = 0.0、0.5、1和2）膜已经制备和研究，目的是确定稳定性和电化学性能之间的最佳折衷。实际上，已知La_2NiO_（4 +δ）具有较高的化学稳定性，而Pr_2NiO_（4 +δ）具有较好的电化学性质。发现混合相的性质介于Pr_2NiO_（4 +δ）和La_2NiO_（4 +δ）之间。化学稳定性通过增加Pr含量而降低。此外，通过静电喷涂沉积并丝网印刷设计了新型双层La_（2-x）Pr_xNiO_（4 +δ）阴极。发现双层LaPrNiO_（4 +δ）阴极的极化电阻（R_（pol））在600℃时等于0.11Ωcm〜2，这是该组合物中文献中可获得的最低值。

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  • 会议地点 San Diego(US)
  • 作者

    R.K. Sharma; O. Celikbilek; M. Burriel; L. Dessemond; J. M. Bassat; E. Djurado;

  • 作者单位

    Univ. Grenoble Alpes, LEPMI, F-38000 Grenoble, France,CNRS, F-38000 Grenoble, France,ICMCB-CNRS, 87 Av. du Albert Schweitzer, 33608 Pessac, France;

    Univ. Grenoble Alpes, LEPMI, F-38000 Grenoble, France,CNRS, F-38000 Grenoble, France;

    University Grenoble Alpes, CNRS, LMGP, F-38000 Grenoble, France;

    Univ. Grenoble Alpes, LEPMI, F-38000 Grenoble, France,CNRS, F-38000 Grenoble, France;

    ICMCB-CNRS, 87 Av. du Albert Schweitzer, 33608 Pessac, France;

    Univ. Grenoble Alpes, LEPMI, F-38000 Grenoble, France,CNRS, F-38000 Grenoble, France;

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