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Cryogenic cooled silicon-based x-ray optical elements: heat load limit

机译:低温冷却的硅基X射线光学元件:热负荷极限

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Abstract: A silicon block (typical size 100 $MUL 100 $MUL (20 - 50) mm$+3$/) cooled by liquid nitrogen has been studied with various incident power densities and spot sizes on the surface. Gaussian power distribution was assumed. Both bottom cooling and side cooling have been considered. The thermal slope error has been minimized by optimizing the cooling conditions (cooling coefficient and bulk temperature of liquid nitrogen) and the thickness of the silicon block. Finite element analysis has been used because the material properties ($alpha@, k) of silicon are highly non linear. The limits of absorbed total power and power density are estimated for both undulator and wiggler beams with various spot sizes and for the requirement in terms of thermal slope error. Correlations between thermal slope error and power, power density have been established. !6
机译:摘要:已经研究了通过液氮冷却的硅块(典型尺寸为100 $ MUL 100 $ MUL(20-50)mm $ + 3 $ /),具有各种入射功率密度和表面斑点大小。假定为高斯功率分布。已经考虑了底部冷却和侧面冷却。通过优化冷却条件(液氮的冷却系数和体温)和硅块的厚度,可以将热斜率误差降至最低。由于硅的材料特性($ alpha @,k)是高度非线性的,因此已使用有限元分析。对于具有各种光斑尺寸的波动光束和摆动光束,以及对热斜率误差的要求,都估算了吸收的总功率和功率密度的极限。已经建立了热斜率误差与功率,功率密度之间的相关性。 !6

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