首页> 外文会议>High-Power Laser Ablation VI pt.1 >Ion emission from fused silica under 157-nm excimer laser irradiation at fluences below plasma formation threshold: the role of surface defects

【24h】

Ion emission from fused silica under 157-nm excimer laser irradiation at fluences below plasma formation threshold: the role of surface defects

机译：在低于等离子体形成阈值的注量下，在157 nm受激准分子激光辐照下，熔融石英中的离子发射：表面缺陷的作用

获取原文

获取原文并翻译 | 示例

页面导航

摘要
著录项
相似文献
相关主题

摘要

At fluences well below the threshold for plasma formation, we have characterized the direct desorption of atomic ions from fused silica surfaces during 157-nm irradiation by time-resolved mass spectroscopy. The principal ions are Si~+ and O~+. The emission intensities are dramatically increased by treatments that increase the density of surface defects. Molecular dynamics simulations of the silica surface suggest that silicon ions bound at surface oxygen vacancies (analogous to E' centers) provide suitable configurations for the emission of Si~+. We propose that emission is best understood in terms of a hybrid mechanism involving both antibonding chemical forces (Menzel-Gomer-Redhead model) and repulsive electrostatic forces on the adsorbed ion after laser excitation of the underlying defect.

机译：在远低于等离子体形成阈值的注量下，我们已经表征了通过时间分辨质谱法在157 nm辐照过程中从熔融石英表面直接解吸原子离子。主离子为Si〜+和O〜+。通过增加表面缺陷密度的处理，发射强度大大提高。二氧化硅表面的分子动力学模拟表明，结合在表面氧空位（类似于E'中心）的硅离子为Si〜+的发射提供了合适的构型。我们提出，最好根据混合机理来理解发射，该混合机理涉及反键化学力（Menzel-Gomer-Redhead模型）和激光激发潜在缺陷后对吸附离子的排斥静电力。

著录项

来源
《High-Power Laser Ablation VI pt.1》|2006年|P.626108.1-626108.11|共11页
会议地点 TaosNM(US)
作者
S. R. John; S. C. Langford; J. T. Dickinson;
展开▼
作者单位

Department of Physics Astronomy, Washington State University, Pullman, WA 99164-2814;

展开▼
会议组织
原文格式 PDF
正文语种 eng
中图分类激光技术、微波激射技术;
关键词

相似文献

外文文献
中文文献
专利

1. Erratum: "Plasma formation and structural modification below the visible ablation threshold in fused silica upon femtosecond laser irradiation" [Appl. Phys. Lett. 91, 082902 (2007)] [J] . D. Puerto, W. Gawelda, J. Siegel, Applied Physicsletters . 2008,第21期

机译：勘误：“飞秒激光辐照下熔融石英中的等离子体形成和结构改性低于可见的烧蚀阈值”物理来吧91，082902（2007）]
2. Laser fluence dependence of ripple formation on fused silica by femtosecond laser irradiation [J] . Shi Xuesong, Xu Xuefeng Applied Physics . 2019,第4期

机译：飞秒激光辐照对熔融石英波纹形成的激光能量密度依赖性
3. Laser fluence dependence of ripple formation on fused silica by femtosecond laser irradiation [J] . Shi Xuesong, Xu Xuefeng Applied Physics . 2019,第4期

机译：通过飞秒激光照射熔化模块对熔化二氧化硅的激光流量依赖性
4. Ion emission from fused silica under 157-nm excimer laser irradiation at fluences below plasma formation threshold: the role of surface defects [C] . S. R. John, S. C. Langford, J. T. Dickinson, Conference on High-Power Laser Ablation . 2006

机译：熔融二氧化硅的离子排放在157-nm准分子激光照射下的流量低于等离子体形成阈值：表面缺陷的作用
5. Interaction of 157-nm excimer laser light with fused silica, polytetrafluoroethylene and calcium fluoride. [D] . George, Sharon Rose. 2010

机译：157 nm准分子激光与熔融石英，聚四氟乙烯和氟化钙的相互作用。
6. Surface molecular structure defects and laser-induced damage threshold of fused silica during a manufacturing process [O] . Yuan Li, Hongwei Yan, Ke Yang, -1

机译：制造过程中熔融石英的表面分子结构缺陷和激光诱导的损伤阈值
7. Erratum: ¿Plasma formation and structural modification below the visible ablation threshold in fused silica upon femtosecond laser irradiation¿ [O] . Puerto, D., Gawelda, W., Siegel, Jan, 2013

机译：勘误：“飞秒激光辐照下熔融石英中的等离子体形成和结构改性低于可见的烧蚀阈值”
8. Effects of Excimer Laser Irradiation on the Transmission, Index of Refraction, and Density of Ultraviolet Grade Fused Silica. [R] . Rothschild, M., Ehrlich, D. J., Shaver, D. C. 1989

机译：准分子激光照射对紫外级熔融石英透射率，折射率和密度的影响。

Ion emission from fused silica under 157-nm excimer laser irradiation at fluences below plasma formation threshold: the role of surface defects

摘要

著录项

相似文献

相关主题

期刊订阅