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首页> 外文会议>High-Power Laser Ablation VI pt.2 >Experimental study of front and back ablation of metal thin film using ultrashort laser pulses
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Experimental study of front and back ablation of metal thin film using ultrashort laser pulses

机译：超短激光脉冲对金属薄膜进行正面和背面烧蚀的实验研究

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In order to control the technique of laser-induced forward transfer (LIFT) in ultrashort regimes, it is necessary to understand the different basic mechanisms involved during the three steps: ablation-transfer-deposition. Back ablation of Cr thin film has been studied and compared to the front ablation of the same film in the same conditions. Experiments have been performed using ultrashort laser pulses (800 nm, 100 fs). The dynamics of the plumes have been monitored with a gated intensified charge coupled device (ICCD) camera. Image analysis gave us indications on the velocity and the composition of the ejected material. A parametric study of the ablation thresholds and ablation dynamics has been carried out as a function of the incident laser fluence and the thickness of the metal layer. These results contribute to optimize a process of LIFT. Transfers of Cr on glass and Silicon were obtained with a good spatial resolution
机译：为了控制超短时激光诱导的正向转移（LIFT）技术，有必要了解三个步骤涉及的不同基本机制：烧蚀-转移-沉积。研究了Cr薄膜的背面烧蚀，并将其与相同条件下相同薄膜的正面烧蚀进行了比较。使用超短激光脉冲（800 nm，100 fs）进行了实验。羽流的动态已通过门控增强电荷耦合器件（ICCD）摄像机进行了监控。图像分析为我们提供了喷射材料的速度和成分的指示。根据入射激光通量和金属层厚度对烧蚀阈值和烧蚀动力学进行了参数研究。这些结果有助于优化LIFT的过程。 Cr在玻璃和硅上的转移具有良好的空间分辨率

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