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Near-field microscopy of second-harmonic generation

机译:次谐波产生的近场显微镜

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摘要

Abstract: New experimental technique for near-field observation of second-harmonic generation is discussed. This technique gives the unique possibility for the investigation of local optical nonlinear processes with subwavelength resolution and will be useful for the characterization of materials as well as for fabrication and utilization of optical nonlinear devices at nanometer scale. Peculiarities of optical nonlinear processes in near-field region have been studied. The difference in the mechanisms of second-harmonic generation for different polarizations of excitation light has been demonstrated for rough metal surfaces. The dependence of second-harmonic intensity on tip-surface distance has been examined verifying the presence of strong evanescent SH field components. The technique has been applied for characterization of optical nonlinear crystals (LiNbO$-3$/ and KDP), ferromagnetic and ferroelectric materials. The spatial resolution of the microscope in the SH light collection mode has been determined to be better than 150 nm. !27
机译:摘要:探讨了二次谐波近场观测的新实验技术。该技术为研究具有亚波长分辨率的局部光学非线性过程提供了独特的可能性,并且将对材料的表征以及纳米级光学非线性器件的制造和利用有用。研究了近场区域光学非线性过程的特殊性。对于粗糙的金属表面,已经证明了不同激发光偏振的二次谐波产生机理的差异。已经检查了二次谐波强度对尖端表面距离的依赖性,从而验证了强消逝SH场分量的存在。该技术已用于表征光学非线性晶体(LiNbO $ -3 $ /和KDP),铁磁和铁电材料。已确定在SH光收集模式下显微镜的空间分辨率优于150 nm。 !27

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