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首页> 外文会议>IEEE International Conference on Plasma Science >Potential Distribution Over A Dielectric Surface Irradiated By An Electron Beam At Forevacuum Pressures *
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Potential Distribution Over A Dielectric Surface Irradiated By An Electron Beam At Forevacuum Pressures *

机译：前束压力下电子束辐照介电表面的电势分布*

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Summary form only given. Electron beam evaporation of crystalline boron is a new method of deposition of boron-containing coatings. The problem in this method is that at pressures typical of electron beam heating (less than 0.1 Pa), the surface of a boron target, being dielectric in its normal state, is charged by an electron beam to a high potential which deflects and even reflects the beam electrons, thus decreasing the efficiency of heating and evaporation of the target. The problem is solved by increasing the pressure to forevacuum values (1-100 PA) at which the negative charge brought by an electron beam to the target surface is compensated by positive gas ions from the beam plasma
机译：仅提供摘要表格。电子束蒸发结晶硼是沉积含硼涂层的一种新方法。该方法的问题在于，在电子束加热的典型压力（小于0.1 Pa）下，处于正常状态的电介质硼靶的表面被电子束充电至高电势，该电势会偏转甚至反射束电子，从而降低了靶的加热和蒸发效率。通过将压力提高到前排值（1-100 PA）可以解决该问题，在该值下，电子束带到目标表面的负电荷会被来自束等离子体的正气体离子补偿

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