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Adjacent and far track erasure dependence on media SUL permeability in shielded PMR head recording

机译:在屏蔽PMR磁头记录中,远近擦除取决于介质SUL渗透性

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Adjacent or far track erasure (ATE or FTE) in PMR recording can limit the recording track density. In a typical PMR head design, a shield is added near to the write pole to increase the write field gradient. The shield, however, leads to an additional flux path during writing, resulting in the erasure of neighboring tracks and bit error rate (BER) degradation. The media soft underlayer (SUL) is a part of the flux return path and its magnetic properties can also affect the ATE performance [1]. In this study, we report on systematic experimental and modelling results of ATE and FTE behavior of a PMR head with a wrapped-around shield (WAS) as a function of the SUL permeability and thickness.
机译:PMR记录中的相邻或远距擦除(ATE或FTE)会限制记录磁道的密度。在典型的PMR磁头设计中,在写极附近增加了一个屏蔽层,以增加写磁场梯度。但是,屏蔽层会在写入过程中导致一条额外的磁通路径,从而导致相邻磁道的擦除和误码率(BER)的下降。介质软底层(SUL)是磁通返回路径的一部分,其磁性能也会影响ATE性能[1]。在这项研究中,我们报告了带有环绕式屏蔽(WAS)的PMR磁头的ATE和FTE行为的系统实验和建模结果,该结果与SUL磁导率和厚度有关。

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