首页> 外文会议>IMAPS 40th international symposium on microelectronics >Examination of Thermal via Design within LTCC Structures
【24h】

Examination of Thermal via Design within LTCC Structures

机译:LTCC结构中的散热通孔设计检查

获取原文
获取原文并翻译 | 示例

摘要

Increased power density applications especially for front-end modules have created the need for adequate thermal management in microwave design. Although LTCC has a lower thermal resistance than PCB substrates it is still desirable to lower the resistance further by introducing thermal conductor filled via arrays. Thermal via design within LTCC structures,following public domain guidelines,is investigated in this paper. A thermal imaging system using an infrared camera was used to measure the top surface temperature over a range of powers and design variables. Design variables include via size and spacing. The study includes calculating an equivalent thermal resistance empirically and checking the empirical data against existing theory.
机译:功率密度应用的增加,尤其是前端模块的功率密度应用,导致在微波设计中需要适当的热管理。尽管LTCC具有比PCB基板更低的热阻,但仍需要通过引入填充有热导体的通孔阵列来进一步降低电阻。根据公共领域的指导原则,本文研究了LTCC结构内的热通孔设计。使用红外热像仪的热成像系统用于测量一系列功率和设计变量下的顶表面温度。设计变量包括通孔尺寸和间距。该研究包括根据经验计算等效热阻,并根据现有理论检查经验数据。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号