Planar diffusion-based processes for the fabrication of integrated optical and electronic components (Invited Paper)

机译：基于平面扩散的集成光学和电子元件制造工艺（邀请论文）

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Abstract: The discovery of the phenomenon of impurity-induced layer disordering (IILD) has enabled novel device geometries to be applied to the task of patterning heterostructure layers for the realization of high-performance optoelectronic devices. In this paper we review progress in the various ways of implementing and controlling the IILD process, and discuss several of the potentially important device concepts for optoelectronic integration that are enabled by this technology. !28

机译：摘要：杂质诱导层无序现象（IILD）的发现使新颖的器件几何结构可用于构图异质结构层的任务，以实现高性能的光电器件。在本文中，我们回顾了实现和控制IILD流程的各种方式的进展，并讨论了该技术支持的一些潜在重要的光电集成器件概念。！28

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来源
《Integrated Optoelectronics for Communication and Processing》|1991年|p.194-205|共12页
会议地点 Boston MA(US);Boston MA(US)
作者
Robert L. Thornton; Xerox Palo Alto Research Ctr.; Palo Alto; CA; USA.;
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原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
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Planar diffusion-based processes for the fabrication of integrated optical and electronic components (Invited Paper)

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