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首页> 外文会议>International Conference on Advances in Machining amp; Manufacturing Technology in China; 20070816-19; Harbin(CN) >Investigation on Strain Films in the Thin Film Resistance Strain Gauge
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Investigation on Strain Films in the Thin Film Resistance Strain Gauge

机译：薄膜电阻应变计中应变膜的研究

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摘要

Strain films in the thin film resistance strain gauge are prepared by magnetron sputtering method. Some results concerning the electromechanical and structural properties of nichrome (Ni80Cr20 wt.%) thin films are presented. As compared to the well-known Ni-Cu (constantan) alloy film, which are widely used for manufacturing pressure and force sensors, nichrome (Ni80Cr20 wt.%) thin films exhibit gauge factor values of the same order of magnitude, but they are much more corrosion resistant and adherent to the substrate. The influences of composition and post-deposition annealing on the electrical resistance, temperature coefficient of resistance (TCR) and gauge factor of nichrome (Ni80Cr20 wt.%) thin films are discussed.
机译：薄膜电阻应变计中的应变膜是通过磁控溅射法制备的。提出了一些有关镍铬合金（Ni80Cr20 wt。％）薄膜的机电性能和结构性能的结果。与广泛用于制造压力和力传感器的著名的Ni-Cu（constantan）合金膜相比，镍铬（Ni80Cr20 wt。％）薄膜的标称系数值处于相同的数量级，但是它们更加耐腐蚀并附着在基材上。讨论了组成和沉积后退火对镍铬（Ni80Cr20 wt。％）薄膜的电阻，电阻温度系数（TCR）和应变系数的影响。

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