• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>International conference on mechatronics technology >Compensation of Defocus Phase Aberrations in in-Situ off-Axis Digital Holographic Microscopy
【24h】

Compensation of Defocus Phase Aberrations in in-Situ off-Axis Digital Holographic Microscopy

机译：原位离轴数字全息显微镜的散焦相差补偿

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Digital holographic microscopy allows fast,nondestructive,full field,high-resolution quantitative amplitude and phase contrast so that it is widely used in many applications.It is necessary to correct the phase aberrations of digital holographic microscopy during the precise measurement.In this paper,we present a new method for compensate the phase aberrations by using the cooperative process of the numerical simulation of the reference wave front and the adjustment of the reference beam.The numerical simulation of the reference wave front is used for getting the replica of the reference wave front and the adjustment of the reference beam is used for compensating the aberrations of the setup which lead a precise measurement.The surface profiles of two microstructures are measured for evaluating the feasibility of the compensation method.
机译：数字全息显微镜可以实现快速，无损，全场，高分辨率的定量振幅和相位对比，因此在许多应用中得到了广泛的应用。在精确测量过程中，有必要校正数字全息显微镜的相差。通过参考波前数值模拟与参考光束调整的协同过程，提出了一种补偿相差的新方法。参考波前数值模拟用于获得参考波的副本。前端和参考光束的调整用于补偿可导致精确测量的装置像差。测量两个微结构的表面轮廓，以评估补偿方法的可行性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号