• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>International Conference on Precision Engineering and Micro/Nano Technology in Asia vol.2; 20051112-14; Shenzhen(CN) >Investigation on the Effects of Tip Geometry in AFM Lithography Process Using MD Analysis
【24h】

Investigation on the Effects of Tip Geometry in AFM Lithography Process Using MD Analysis

机译：使用MD分析研究AFM光刻过程中尖端几何形状的影响

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

To fabricate microano structures with high precision using the AFM-based lithography approach, a three dimensional model of molecular dynamics is used to simulate lithography process using AFM diamond tip and study the effects of tip geometry on it. Three kinds of tip models are proposed: a cone-shape tip with a hemisphere at the end, a round-edged three sided pyramid tip with a hemisphere at the end and a sharp-edged three sided pyramid tip. Results show that tip geometry, including the radius of the hemisphere, the scratching depth and scratching directions have great effects on the materials removal process. Moreover, the analysis of scratching forces shows that machining states at various depths can be simulated by using different tip models.
机译：为了使用基于AFM的光刻方法高精度地制造微/纳米结构，使用了分子动力学的三维模型来模拟使用AFM金刚石尖端的光刻过程，并研究尖端几何形状对其的影响。提出了三种尖端模型：末端为半球的圆锥形尖端，末端为半球的圆形三棱锥尖端和锐利的三棱锥尖端。结果表明，尖端几何形状（包括半球半径，刮擦深度和刮擦方向）对材料去除过程有很大影响。此外，对划痕力的分析表明，可以通过使用不同的刀头模型来模拟不同深度的加工状态。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号