• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>International Conference on Processing amp; Manufacturing of Advanced Materials Pt.4; Jul 7-11, 2003; Leganes, Madrid, Spain >Chemical approach to the deposition of textured CeO_2 buffer layers based on sol gel dip coating
【24h】

Chemical approach to the deposition of textured CeO_2 buffer layers based on sol gel dip coating

机译：基于溶胶凝胶浸涂的化学方法沉积带纹理的CeO_2缓冲层

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

The widespread use of vacuum techniques for the development of coated conductors, in which buffer and superconducting (REBa_2Cu_3O_(7-δ)) layers are deposited epitaxially on a substrate, is well established in the research environment. However, obtaining uninterrupted deposition at high speed, increasing flexibility in composition and in film thickness and attaining independence of geometric constraints are areas in which many vacuum techniques will need sustained development in order to answer industrial demands. This work describes the deposition of textured CeO_2 buffer layers based on sol gel dip coating under atmospheric environment and from aqueous precursor materials. Research has been performed towards the deposition of CeO_2-buffer layers using the amorphous citrate method on sapphire substrates and Ni-W foils. Coating is performed using the dip-coating technique, which allows extension to a continuous system. The withdrawal speed and the thermal treatment have been optimised in order to obtain highly oriented (001) layers exhibiting a smooth and crack-free morphology both on ceramic and metallic substrates. From the results it was concluded that sintering atmosphere and sintering temperature play a crucial role in the growth mechanism. This study describes the structural and morphological analysis of the thin layer with special attention to the difference between ceramic and metallic substrates.
机译：在研究环境中，真空技术已广泛用于开发涂层导体，其中缓冲层和超导（REBa_2Cu_3O_（7-δ））外延层沉积在基板上。然而，高速获得不间断的沉积，增加组成和膜厚度的灵活性以及获得几何约束的独立性是许多真空技术需要持续发展以满足工业需求的领域。这项工作描述了在大气环境下基于溶胶凝胶浸涂并从水性前体材料中沉积有纹理的CeO_2缓冲层的方法。已经进行了使用非晶柠檬酸盐方法在蓝宝石衬底和Ni-W箔上沉积CeO_2缓冲层的研究。使用浸涂技术进行涂布，这可以扩展到连续系统。为了获得高度定向的（001）层，在陶瓷和金属基材上均表现出光滑且无裂纹的形态，已经优化了拉拔速度和热处理。从结果可以得出结论，烧结气氛和烧结温度在生长机理中起着至关重要的作用。这项研究描述了薄层的结构和形态分析，并特别注意了陶瓷和金属基材之间的区别。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号