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首页> 外文会议>International Conference on Processing amp; Manufacturing of Advanced Materials; 20060704-08; Vancouver(CA) >Embossing on epoxy thermoset polymer using SiO_2 coated nickel template
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Embossing on epoxy thermoset polymer using SiO_2 coated nickel template

机译：使用SiO_2涂层镍模板在环氧热固性聚合物上压花

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摘要

Embossing or imprint lithography is the key-technology for the mass production of nano-sized structures with low cost. Currently Si or quartz template which is produced by e-beam or DUV lithography and reactive ion etching, is used. However they are very expensive and easily damaged due to their brittleness. On the other hand, Ni template has high mechanical durability and can be fabricated with low cost by electroplating. However, one of the key obstacles of Ni template is poor antistiction property, when it is used with sticky thermoset polymer. Due to its poor antistiction property, detachment of Ni template from epoxy substrate is one of the key obstacles. In this experiment, quartz template with 150nm to lμm sized surface protrusion was fabricated and used to emboss the PMMA coated Si wafer. Then the imprinted PMMA layer was coated with metal seed layer and electroplating of Ni was followed to fabricate Ni template with l50nm to lμm sized patterns. In order to form antistiction layer on Ni template, SAM antistiction layer was formed on SiO_2 coated Ni template. As a result, nano patterns could be successfully transferred to sticky thermoset polymer using Ni template without any degradation of antistiction property.
机译：压印或压印光刻是低成本大规模生产纳米结构的关键技术。当前，使用通过电子束或DUV光刻和反应性离子蚀刻生产的Si或石英模板。然而，它们非常昂贵并且由于其脆性而容易损坏。另一方面，Ni模板具有高机械耐久性，并且可以通过电镀以低成本制造。然而，当与粘性热固性聚合物一起使用时，Ni模板的主要障碍之一是其抗粘连性差。由于其抗粘着性差，Ni模板从环氧基材上的剥离是主要障碍之一。在该实验中，制造了具有150nm至1μm大小的表面突起的石英模板，并将其用于压印PMMA涂层的Si晶片。然后，在压印的PMMA层上涂覆金属籽晶层，然后电镀镍，以制作具有150nm至1μm尺寸的图案的Ni模板。为了在Ni模板上形成抗粘连层，在SiO_2涂覆的Ni模板上形成SAM抗粘连层。结果，可以使用Ni模板将纳米图案成功转移到粘性热固性聚合物上，而不会降低抗粘着性。

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