Modelling Evolution of Nanostructures in Lateral Etching Processes

机译：在横向蚀刻过程中模拟纳米结构的演变

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The model of the evolution of nano- and microstructures in the self-formation process of underetching (lateral etching) layers was created for analysis and design of new self-alignment and self-formation technologies semiconductor devices and integrated circuits. The program was realized on the basis of a personal computer with the processor INTEL PENTIUM 4 and MATLAB 5.3 software. The results of the simulation were given for the different initial configurations of nanostructures. The experimental investigations evolution of microstructures in lateral etching processes of amorphous and polycrystalline films were performed and the results presented.

机译：建立了底蚀（横向蚀刻）层自形成过程中纳米结构和微观结构演变的模型，用于分析和设计新的自对准和自形成技术的半导体器件和集成电路。该程序是在带有处理器INTEL PENTIUM 4和MATLAB 5.3软件的个人计算机上实现的。仿真结果给出了纳米结构的不同初始配置。进行了非晶和多晶薄膜横向腐蚀过程中微观结构的实验研究，并提出了结果。

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来源
《International Conference on Self-Formation Theory and Applications; 20031126-20031128; Vilnius; LT》|2003年|P.215-220|共6页
会议地点 Vilnius(LT)
作者
R. Navickas; M. Romanov;
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作者单位

Radioengineering Department, Electronics Faculty, Vilnius Gediminas Technical University, Naugarduko 41-437, LT-2006 Vilnius, Lithuania;

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会议组织
原文格式 PDF
正文语种 eng
中图分类系统的分解与协调技术;
关键词
self-formation processes; lateral etching; evolution of nanostructures; microstructures; semiconductor devices; integrated circuits;

机译：自形成过程;侧向蚀刻;纳米结构的演化;微观结构;半导体器件;集成电路;

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2. 液态Ca70Mg30合金快速凝固过程中纳米团簇结构形成演变特性模拟 [J] . 周丽丽, 刘让苏, 田泽安中国有色金属学报：英文版 . 2013,第008期
3. Modelling Evolution of Nanostructures in Lateral Etching Processes [J] . R. Navickas, M. Romanov Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2004,第0期

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6. Modelling Evolution of Nanostructures in Lateral Etching Processes [C] . R. Navickas, M. Romanov, Solid State Phenomena v.97-98 International conference on self-formation theory and applications . 2004

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7. Temporal evolution of surface structure and morphology in thin-film growth and etching processes. [D] . Drotar, Jason Todd. 2002

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9. LDRD final report : on the development of hybrid level-set/particle methods for modeling surface evolution during feature-scale etching and deposition processes. [O] . McBride, Cory L. (Elemental Technologies, American Fork, UT), Schmidt, Rodney Cannon, Musson, Lawrence Cale 2005

机译：LDRD最终报告：关于在特征尺度蚀刻和沉积过程中建模表面演变的混合水平集/粒子方法的开发。

Modelling Evolution of Nanostructures in Lateral Etching Processes

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