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Nanostep and Film-coatings thickness traceability

机译:纳米级和薄膜涂层的厚度可追溯性

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摘要

Nanosteps are important features in nanometrology. They are used for comparison of measurement accuracy in nanometer range at different laboratories and countries with different measurement methods. However, the nanosteps usually used for these purposes have both flats of the same material (homogeneous), which do not reveal the possible bias in measurement uncertainty for different measurement methods. The latter is especially important for measurement traceability of thin coating nanosteps on different substrates (heterogeneous). We have found that combined (homogeneous/ heterogeneous) standards are more effective in traceability flowcharts. In addition, non-informative influence quantities and statistically evaluated surface roughness should be limited or compensated in thin film-coating thickness measurements. The consistency criterion can show the bias between different interferometric, contact stylus, and atomic force microscopy (AFM) measurement systems. However, this criterion is a conditional one. The contact measurements with small measuring force are more consistent for the heterogeneous nanosteps than are the interferometric non-contact measurements. We have proved also that AFM rectangular cantilever has different bending constants at higher more sensitive modes, which is important in permanent and tapping applications within the repulsive (contact) and attractive (non-contact) regimes. Besides that, the real coatings and substrates may have significant surface roughness (technological and functional), which can change the contact deformation and adhesion. We have derived simple theoretical proportions between the true RMS (R_q) and mean arithmetic (R_a) roughness parameters at different statistical distributions of irregularities and surface profiles, and compared them to the experimental data. These and other presented developments are helpful for improving traceability in the thin film-coatings thickness measurement.
机译:纳米台阶是纳米计量学中的重要特征。它们用于比较不同实验室和不同测量方法国家的纳米范围内的测量精度。但是,通常用于这些目的的纳米级台阶具有相同材料的两个平面(均质),这对于不同的测量方法不会揭示测量不确定度的可能偏差。后者对于在不同基材(异质)上测量薄涂层纳米步骤的可追溯性尤其重要。我们发现,组合(同质/异质)标准在可追溯性流程图中更有效。此外,在薄膜涂层厚度测量中,应限制或补偿非信息性影响量和经统计评估的表面粗糙度。一致性标准可以显示不同的干涉仪,接触笔和原子力显微镜(AFM)测量系统之间的偏差。但是,此条件是有条件的。与干涉式非接触式测量相比,对于异质纳米台阶而言,具有较小测量力的接触式测量更加一致。我们还证明了AFM矩形悬臂在更高的敏感模式下具有不同的弯曲常数,这在排斥(接触)和吸引(非接触)状态下的永久性和攻丝应用中很重要。除此之外,真实的涂层和基材可能具有明显的表面粗糙度(技术和功能性),这可能会改变接触变形和附着力。我们得出了在不规则性和表面轮廓的不同统计分布下,真实RMS(R_q)和平均算术(R_a)粗糙度参数之间的简单理论比例,并将它们与实验数据进行了比较。这些以及其他提出的进展有助于改善薄膜涂层厚度测量中的可追溯性。

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