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首页> 外文会议>IV Workshop on Atomic and Molecular Physics ; Sep 19-21, 2002; Jurata, Poland >Chromatic monitoring technique for thickness measurement of thin transparent films
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Chromatic monitoring technique for thickness measurement of thin transparent films

机译：透明薄膜厚度测量的色度监测技术

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摘要

The main topic of this work is the development and optimisation of a new measurement method used for in-situ thickness monitoring of thin films grown using plasma. Because of their inherent limitations, measurement methods described in literature cannot be used during the low-temperature plasma processes as they are sensitive to optical noise generated by plasma and the substrate heater. To address this problem, a new method, based on chromatic sensing, has been developed. The monitored film is illuminated by polychromatic light which interferes in it, is reflected from it and collected by three detectors with spectral responsivities coincided with human eye. Based on signals from these detectors and known relationship between the spectrum of the reflected light and the thickness of the film, it is possible to monitor the thickness of the film in real time.
机译：这项工作的主要主题是开发和优化一种新的测量方法，该方法用于原位监测使用等离子体生长的薄膜的厚度。由于它们固有的局限性，文献中描述的测量方法不能在低温等离子体工艺期间使用，因为它们对等离子体和基板加热器产生的光学噪声敏感。为了解决这个问题，已经开发了一种基于色感测的新方法。被监视的胶片受到多色光的照射，该多色光对其产生干扰，然后被多色光反射并由三个检测器收集，它们的光谱响应与人眼一致。基于来自这些检测器的信号以及反射光的光谱与膜的厚度之间的已知关系，可以实时地监视膜的厚度。

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