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Processing ceramics by laser radiation

机译:通过激光辐射加工陶瓷

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摘要

Abstract: Microprocessing and film deposition with laser radiation of short wavelength and pulse length are investigated to present their process capabilities for the manufacturing of surface structures and layers within precision ceramic (BaTiO$-3$/, Si$-3$/N$-4$/, SiC) components. The microprocessing with fundamental (1 approximately ega@) and higher harmonic (2 approximately ega@, 3 approximately ega@) Nd:YAG laser radiation (ns- and ps-pulses) is performed yielding structural dimensions below 20 $mu@m during drilling and caving with the results related to the removal threshold fluence and the removal rate per pulse. The film deposition with excimer laser radiation ($lambda$-L$/ $EQ 248 nm, $tau$-L$/ $EQ 20 ns) achieves monolayer thin films of different properties according to the laser parameters and processing variables with the results related to deposit multilayer film systems. The properties of the structures and of the films are analyzed by profilometry, optical and electrical microscopy, as well as X-ray photoelectron spectroscopy. Examples are highlighted for various ceramics and discussed in view of applications of the structures and films generated.!17
机译:摘要:研究了短波长和脉冲长度激光辐射的微处理和薄膜沉积,以展示其在精密陶瓷(BaTiO $ -3 $ /,Si $ -3 $ / N $- 4 $ /,SiC)组件。对Nd:YAG激光辐射(ns和ps脉冲)进行具有基波(1约ega @)和高次谐波(2约ega @,3约ega @)的微处理,从而在钻孔过程中产生的结构尺寸小于20 $ mu @ m并得出与去除阈值通量和每脉冲去除率有关的结果。利用准分子激光辐射($ lambda $ -L $ / $ EQ 248 nm,$ tau $ -L $ / $ EQ 20 ns)进行薄膜沉积可根据激光参数和加工变量获得具有不同特性的单层薄膜,结果与沉积多层膜系统有关。通过轮廓测定法,光学和电镜以及X射线光电子能谱分析结构和膜的性质。重点介绍了各种陶瓷的示例,并针对所生成的结构和薄膜的应用进行了讨论!17

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