• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Laser applications in microelectronic and optoelectronic manufacturing (LAMOM) XVI >Nanostructure formation on silicon surfaces by high repetition-rate sub-15 femtosecond near-infrared laser pulses
【24h】

Nanostructure formation on silicon surfaces by high repetition-rate sub-15 femtosecond near-infrared laser pulses

机译：高重复率低于15飞秒的近红外激光脉冲在硅表面形成纳米结构

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

We report on the formation of characteristic surface features on Si(100) surfaces, which were generated by 85 MHz, sub-15 fs pulsed Ti:Sapphire laser light at a centre wavelength of 800 nm. With the Si(100) surface immersed in water, the high peak intensity in the tight focus of a high-numerical aperture objective resulted in profound structural and compositional surface modification at a periodicity of 1.0 μm. Oxide particles were formed at pulse energies below 0.3 nJ, whereas sub-10 nm hole arrangements surrounded by elevated areas were found at even lower focal intensities. The period of structural modulation was independent of the polarization of the laser light. On removal of SiO_2 by hydrofluoric acid etching, the silicon surface revealed tiny rifts oriented perpendicular to the direction of polarization, which were produced at near-threshold intensities at a period of 130 nm. In areas of higher exposure a random arrangement of structural elements of typically 20 nm in size was observed. In contrast, with the sample immersed in oil significant structural change of the Si(100) surface was not induced. However, filaments of carbon compounds at a diameter of approximately 100 nm were deposited periodically in the illuminated area.
机译：我们报告Si（100）表面上形成的特征性表面特征，这些特征是由中心频率为800 nm的85 MHz，亚-15 fs脉冲Ti：蓝宝石脉冲激光产生的。将Si（100）表面浸入水中后，高数值孔径物镜的紧密焦点中的高峰值强度导致以1.0μm的周期性进行深刻的结构和成分表面修饰。在低于0.3 nJ的脉冲能量下会形成氧化物颗粒，而在更低的聚焦强度下却发现了被升高区域包围的低于10 nm的孔排列。结构调制的周期与激光的偏振无关。通过氢氟酸蚀刻去除SiO_2时，硅表面显示出垂直于极化方向取向的细小裂口，该裂口在130 nm处以接近阈值的强度产生。在较高曝光的区域中，观察到大小通常为20 nm的结构元素的随机排列。相反，将样品浸在油中不会引起Si（100）表面的明显结构变化。但是，直径约100 nm的碳化合物细丝会定期沉积在照明区域中。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号