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Improve Large Area Uniformity and Production Capacity of Laser Interference Lithography with Beam Flattening Device

机译：利用光束展平装置提高大面积均匀性和激光干涉光刻的生产能力

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Laser interference lithography (LIL) is a maskless lithography technique with many advantages such as simple optical design, inexpensive, infinite depth of focus, and large area patterning with single exposure. However, the intensity of normal laser beam is Gaussian distribution. In order to obtain large area uniform structure, we have to expand the laser beam much bigger than the wafer and use only the center part of the beam. Resulting in wasting lots of energy and the production capacity decrease. In this study, we designed a beam shaping device which consists of two parallel fused silicon optical window with different coating on both side. Two optical window form an air thin film. When the expanded laser beam pass through the device, the beam will experience many refraction and reflection between two optical window and interference with each other. The transmittance of laser beam will depend on the incident angle. The output intensity distribution will change from Gaussian distribution to a flat top distribution. In our experiment, we combined the beam shaping device with a Lloyd's mirror LIL system. Experiment results indicated that the LIL system with beam shaping device can obtain large area uniform pattern. And compare with the traditional Lloyd's mirror LIL system, the exposure time is shorten up to 4.5 times. In conclusion, this study design a beam flattening device for LIL system. The flat top beam can improve the large area uniformity and the production capacity of LIL. Making LIL more suitable for industry application.
机译：激光干涉光刻（LIL）是一种无掩模光刻技术，具有许多优点，例如光学设计简单，价格便宜，焦点深度无限以及单次曝光即可进行大面积构图。但是，法线激光的强度是高斯分布。为了获得大面积的均匀结构，我们必须将激光束扩展到比晶片大得多的位置，并且仅使用光束的中心部分。结果浪费大量能量，生产能力下降。在这项研究中，我们设计了一种光束整形装置，该装置由两个平行的熔融硅光学窗口组成，两个窗口的两侧都有不同的涂层。两个光学窗口形成空气薄膜。当扩展的激光束通过设备时，该光束将在两个光学窗口之间经历多次折射和反射，并且彼此干扰。激光束的透射率将取决于入射角。输出强度分布将从高斯分布变为平顶分布。在我们的实验中，我们将光束整形设备与劳埃德镜LIL系统结合在一起。实验结果表明，带有光束整形装置的LIL系统可以获得大面积均匀的图案。并且与传统的劳埃德镜LIL系统相比，曝光时间缩短了4.5倍。总之，本研究设计了用于LIL系统的光束平坦装置。平顶梁可以提高LIL的大面积均匀性和生产能力。使LIL更适合行业应用。

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