Investigation of the Electroless Deposition Process of Magnetic Nanostructures

机译：磁性纳米结构的化学沉积过程研究

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We have studied electroless deposition of Ni-B within a template structure as a model process to optimize the deposition of nanostructures. Our results show that depending on the deposition rate and deposition time employed end-opened or end-closed nanotubes connected at both ends by a thin film can be prepared. We have found that if the deposition rate is large, then deposition within the nanotubes is mass transport limited. By reducing the deposition rate the reaction becomes kinetically controlled and continuous uniform nanotubes are formed. The deposition rate was controlled by varying the temperature, pH or concentrations of the reactants. Optimal parameters of 20 ℃, a pH of 10 and a concentration of 0.12 M diammonium citrate have been found for the deposition of magnetic nanostructures. Employing the optimised deposition process we have prepared uniform end open nanotubes and characterized their associated magnetic properties.

机译：我们已经研究了模板结构内Ni-B的化学沉积，作为优化纳米结构沉积的模型过程。我们的结果表明，取决于沉积速率和沉积时间，可以制备通过薄膜在两端连接的端开或端闭纳米管。我们已经发现，如果沉积速率大，则纳米管内的沉积受到传质的限制。通过降低沉积速率，反应变得受到动力学控制，并形成连续均匀的纳米管。通过改变温度，pH或反应物的浓度来控制沉积速率。磁性纳米结构沉积的最佳参数为20℃，pH为10，浓度为0.12 M柠檬酸二铵。通过优化沉积工艺，我们制备了均匀的端部开口纳米管，并对其相关的磁性进行了表征。

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《Magnetic materials, processes, and devices 13》|2014年|39-48|共10页
会议地点 Cancun(MX)
作者
David Richardson; Fernando M.F. Rhen;
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Department of Physics and Energy, University of Limerick, Ireland Materials and Surface Science Institute, University of Limerick, Ireland;

Department of Physics and Energy, University of Limerick, Ireland Materials and Surface Science Institute, University of Limerick, Ireland;

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专利

1. Magnetic Properties of Co-B Nanostructures Prepared Via Electroless Deposition [J] . David Richardson, Fernando M.F. Rhen Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2015,第Null期

机译：通过化学沉积制备的Co-B纳米结构的磁性
2. Preparation of nanostructured silicon surface for mass spectrometry analysis by an all-wet fabrication process using electroless metal deposition and metal assisted etching [J] . Tsao C.-W., Yang Z.-J., Chung C.-W. International journal of mass spectrometry . 2012,第Null期

机译：通过使用化学镀金属和金属辅助蚀刻的全湿制造工艺制备用于质谱分析的纳米硅表面
3. Investigating the effect of magnetic field on pulse electrodeposition of magnetic and non-magnetic nanostructured metals [J] . Fattahi A., Bahrololoom M. E. Surface & Coatings Technology . 2015,第Null期

机译：研究磁场对磁性和非磁性纳米结构金属的脉冲电沉积的影响
4. Investigation of the Electroless Deposition Process of Magnetic Nanostructures [C] . David Richardson, Fernando M.F. Rhen Meeting of The Electrochemical Society . 2015

机译：磁性纳米结构的无电沉积过程研究
5. An Investigation of the CSC-MIG Welding Process for Deposition of Conventional, Ultrafine and Nanostructured MMC Coatings. [D] . Vespa, Patrick. 2011

机译：对用于沉积常规，超细和纳米结构MMC涂层的CSC-MIG焊接工艺的研究。
6. Deposition Process and Properties of Electroless Ni-P-Al2O3 Composite Coatings on Magnesium Alloy [O] . Rong Hu, Yongyao Su, Yurong Liu, 2018

机译：镁合金上化学镀Ni-P-Al2O3复合镀层的沉积工艺及性能
7. New Developments in Chemical Wet Processes. Preparation of Functionally Graded Magnetic Thin Films by Electroless Deposition Process. [O] . Takayuki HOMMA, Tetsuya OSAKA, Hirotaka SATO 2001

机译：化学湿法过程的新发展。无电沉积工艺制备功能梯度磁性薄膜。

Investigation of the Electroless Deposition Process of Magnetic Nanostructures

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