首页> 外文会议>Materials in space environment >ABOUT MECHANISM OF SURFACE ROUGHNESS DEVELOPMENT ON POLY IMIDE FILMS DURING ANISOTROPIC ETCHING BY FAST ATOMIC OXYGEN
【24h】

ABOUT MECHANISM OF SURFACE ROUGHNESS DEVELOPMENT ON POLY IMIDE FILMS DURING ANISOTROPIC ETCHING BY FAST ATOMIC OXYGEN

机译:关于快速原子氧各向异性刻蚀过程中聚酰亚胺薄膜表面粗糙度的形成机理

获取原文
获取原文并翻译 | 示例

摘要

The problem of polymer films etching polyimide in particular by supersonic beam of atomic oxygen (at a mean velocity about 8 km/s) is of considerable interest for service life evaluation and prediction of polymer materials employed in space at low earth orbit. Fast atomic oxygen and sun"s radiation are known as the main factors which cause intensive polymer surface degradation and etching. The main aim of the paper is to reveal mechanism of carpet-like polyimide film surface topography development under bombardment by fast atomic oxygen beam with energy 2-4 eV and intensity 1E16 atoms/cm~2 at an angle between beam direction and normal to the film surface 30 degrees. Morphology and composition of individual protrusions or "hills" of polyimide carpet-like surface topography were studied by analytical electronrnmicroscopy and it was shown that at integral fluence of atomic oxygen 0,5E20 atoms/cm~2 the protrusions have mashroom-shaped structure. They consist of the cylinder "stem" 20-40 nm in diameter and 2 μm in height as well as the "cap" 30-50 nm in diameter and 20-30 nm thick on the top of the "stem". It is determined that the "caps" consist of amorphous diamond-like carbon which has higher resistance to etching by fast atomic rnoxygen compared to the origin polymer and graphite. An assumption is made that the "stems" etching by oxygen atoms scattered in the carpet-like layer cause the diamond-like "caps" separation and their transformation to dust particles.
机译:对于聚合物膜的使用寿命评估和预测在低地球轨道空间中使用的聚合物材料的使用寿命,聚合物膜尤其是通过原子氧的超声波束(平均速度约为8 km / s)蚀刻聚酰亚胺的问题引起了极大的关注。快速原子氧和太阳辐射是引起强烈的聚合物表面降解和蚀刻的主要因素,本文的主要目的是揭示在快速原子氧束轰击下地毯状聚酰亚胺膜表面形貌发展的机理。光束方向与垂直于薄膜表面呈30度角时,能量为2-4 eV,强度为1E16原子/ cm〜2,通过分析电子显微镜研究聚酰亚胺地毯状表面形貌的单个突起或“山丘”的形态和组成结果表明,在原子氧积分通量为0,5E20原子/ cm〜2时,这些突起具有马斯喀特状的结构,它们由直径为20-40 nm,高度为2μm的圆柱“柱”组成。 “帽”的直径为30-50 nm,在其“茎”的顶部厚度为20-30 nm。确定“帽”由无定形的类金刚石碳组成,碳具有较高的耐快速原子核氧化物腐蚀的能力。红色为起源的聚合物和石墨。假定由地毯状层中散布的氧原子进行的“茎干”蚀刻会导致菱形“帽”分离并转变为尘埃颗粒。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号