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首页> 外文会议>Materials in space environment >OXIDATION OF ROOM TEMPERATURE SILICON (001) SURFACES IN A HYPERTHERMAL ATOMIC OXYGEN BEAM
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OXIDATION OF ROOM TEMPERATURE SILICON (001) SURFACES IN A HYPERTHERMAL ATOMIC OXYGEN BEAM

机译：高热原子氧束中室温硅（001）表面的氧化

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摘要

This paper describes the oxidation of Si (001) surfaces at room temperature in a hyperthermal atomic oxygen beam. The laser-detonation-type atomic oxygen beam source, originally designed by Physical Sciences Inc., was used in this study. An intense 5 eV atomic oxygen beam with a fluence of 10~(19) atoms/cm~2 oxidized Si surfaces to a depth of 4.5 nm. X-ray photoelectron spectra and Fourier transform infrared spectra indicate that the amount of suboxide is large and intrinsic stress is incorporated at the silicon/oxide interface. This intrinsic stress restricts the diffusivity of atomic oxygen in the oxide film. These results suggest that a silicon dioxide overlayer for protecting materials from atomic oxygen degradation in low Earth orbit must be at least 4.5 nm thick. However, a 3.5-nm-thick film protected the underlying substrate on samples flown on the EOIM-3 flight experiment. This discrepancy can be explained by the emission of Si atoms at the Si/SiO_2 interface to the SiO_2 film under the extremely high compressive stresses.
机译：本文描述了在高温原子氧束中室温下Si（001）表面的氧化。本研究使用最初由Physical Sciences Inc.设计的激光爆轰型原子氧束源。能量为5 eV的强原子氧束，通量为10〜（19）原子/ cm〜2，可氧化Si表面至4.5 nm的深度。 X射线光电子能谱和傅立叶变换红外光谱表明，次氧化物的量很大，并且固有应力并入了硅/氧化物界面。该固有应力限制了原子氧在氧化物膜中的扩散性。这些结果表明，用于保护材料免受低地球轨道中原子氧降解的二氧化硅覆盖层必须至少为4.5 nm厚。但是，在EOIM-3飞行实验中，一块3.5纳米厚的薄膜保护了样品上的下层基板。这种差异可以通过在极高的压缩应力下从Si / SiO_2界面向SiO_2膜的Si原子发射来解释。

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  • 来源
    《Materials in space environment》|1997年|225-229|共7页
  • 会议地点 Toulouse(FR)
  • 作者

    Masahito Tagawa; Tatsuhiko Ema; Hiroshi Kinoshita; Masataka Umeno; Nobuo Ohmae; Timothy. K. Minton;

  • 作者单位

    Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565, Japan;

    Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565, Japan;

    Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565, Japan;

    Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565, Japan;

    Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565, Japan;

    Department of Chemistry and Biochemistry, Montana State University, 108 Gaines Hall, Bozeman, MT 59717, USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 航空用材料;地面设备、试验场、发射场、航天基地;
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