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INFLUENCE OF MANUFACTURE PROCESSING ON POLYMER SAMPLE ATOMIC OXYGEN EROSION YIELDS

机译:制造工艺对聚合物样品原子氧侵蚀率的影响

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Samples of polyethylene (PE) and polytetrafluoro-ethylene (PTFE) materials exposed to simulated atomic oxygen (AO) exhibit mass erosion yields dependant upon their method of manufacture, density and surface finish. It is proposed that this is due to the internal chemical structure of the polymers for which a higher sample crystallinity results in a lower susceptibility to AO interaction. The manufacturing process of particular interest is that of ion beam sputter deposition, used in the production of thin films (20nm-1μm) of polymer materials for applications such as quartz crystal micro-balance (QCM) and silver film overlay devices. Additionally, changes in the "as supplied" material mass erosion yield and surface erosion morphology are caused by heat annealing processes and preparation of exposure surfaces by mechanical sectioning. These effects may be of concern when calculations of AO fluence are made using the mass loss technique, in which an accurate volume erosion yield for the test polymer is required. Experimental results also suggest that some improvement in AO resilience for an ion beam sputter deposited polymer may be achieved by reducing the rate of deposition.
机译:暴露于模拟原子氧(AO)的聚乙烯(PE)和聚四氟乙烯(PTFE)材料的样品,其制造方法,密度和表面光洁度均显示出大量的侵蚀量。提出这是由于聚合物的内部化学结构所导致的,较高的样品结晶度导致较低的AO相互作用敏感性。特别令人关注的制造工艺是离子束溅射沉积工艺,该工艺用于生产聚合物材料的薄膜(20nm-1μm),用于诸如石英晶体微天平(QCM)和银膜覆盖装置等应用。另外,“按原样供应”的材料质量腐蚀产率和表面腐蚀形态的变化是由热退火工艺和通过机械切片制备暴露表面引起的。当使用质量损失技术进行AO通量计算时,可能需要考虑这些影响,在该方法中,需要精确测试聚合物的体积侵蚀量。实验结果还表明,可以通过降低沉积速率来实现对离子束溅射沉积的聚合物的AO弹性的一些改进。

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