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首页> 外文会议>Mechanical stress evaluation by neutrons and synchrotron radiation >RESIDUAL STRESSES OF Cr-N FILMS DEPOSITED BY ARC ION PLATING INVESTIGATED USING SYNCHROTRON RADIATION
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RESIDUAL STRESSES OF Cr-N FILMS DEPOSITED BY ARC ION PLATING INVESTIGATED USING SYNCHROTRON RADIATION

机译：同步辐射法研究电弧离子镀沉积的Cr-N薄膜的残余应力

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摘要

The structures of Cr-N films deposited by arc ion plating on steel substrates were investigated using a synchrotron radiation system that emits ultraintense X-rays. The Cr-N films were found to be mainly composed of {110} oriented CrN crystals, but they also had a small component of randomly oriented Cr_2N crystals. The CrN220 diffraction shifts to a high diffraction angle as the annealing temperature increases. In contrast, the peak position of the Cr_2N211 diffraction hardly changes with an increase in the annealing temperature up to 873 K. The ratio of nitrogen and oxygen to chromium at the film surface and inside in the film was estimated by Auger electron spectroscopy. After annealing at 973 K, the surface layer was oxidized, but the composition inside the Cr-N films (N/Cr = 0.83) remained unchanged. The residual stress in a 1600-nm-thick as-deposited CrN layer was found to be -11.0 GPa. The residual stresses of Cr-N films relaxed to thermal stress levels on annealing. However, the residual stress in the Cr_2N layer could not be evaluated.
机译：使用发射超强X射线的同步辐射系统研究了通过电弧离子镀在钢基底上沉积的Cr-N膜的结构。发现Cr-N薄膜主要由{110}取向的CrN晶体组成，但也有少量随机取向的Cr_2N晶体组成。 CrN220衍射随着退火温度的升高而移至高衍射角。相反，Cr_2N211衍射的峰值位置几乎不随退火温度的升高而变化，直至873K。通过俄歇电子能谱估计膜表面和膜内部的氮和氧与铬的比率。在973 K退火后，表面层被氧化，但Cr-N膜内部的组成（N / Cr = 0.83）保持不变。发现在厚度为1600 nm的CrN层中的残余应力为-11.0 GPa。退火后，Cr-N薄膜的残余应力松弛到热应力水平。但是，不能评估Cr_2N层中的残余应力。

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