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Coupling Models and Algorithms for 3D Topography Simulation: Plasma Etching, lon Milling and Deposition in SAMPLE-3D

机译：用于3D地形仿真的耦合模型和算法：SAMPLE-3D中的等离子蚀刻，离子铣削和沉积

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《》|2001年|P.9-14|共6页
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Scheckler; E.W.; Neureuther; A.R.;
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中图分类无线电电子学、电信技术;
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专利

1. Models and algorithms for three-dimensional topography simulation with SAMPLE-3D [J] . Scheckler E.W., Neureuther A.R. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems . 1994,第2期

机译：使用SAMPLE-3D进行三维地形模拟的模型和算法
2. Predictable topography simulation of SiO2 etching by C5F8 gas combined with a plasma simulation, sheath model and chemical reaction model [J] . Takagi S., Onoue S., Iyanagi K., Plasma Sources Science & Technology . 2003,第4期

机译：结合等离子体模拟，鞘层模型和化学反应模型的可预测的C5F8气体蚀刻SiO2的形貌模拟
3. A LEVEL SET APPROACH TO A UNIFIED MODEL FOR ETCHING, DEPOSITION, AND LITHOGRAPHY .1. ALGORITHMS AND TWO-DIMENSIONAL SIMULATIONS [J] . Adalsteinsson D., Sethian JA. Journal of Computational Physics . 1995,第1期

机译：用于蚀刻，沉积和光刻的统一模型的水平集方法1。算法和二维模拟
4. Coupling Models and Algorithms for 3D Topography Simulation: Plasma Etching, lon Milling and Deposition in SAMPLE-3D [C] . Scheckler E.W., Neureuther A.R., Institute of Electric and Electronic Engineer Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits . 2001

机译：3D地形仿真耦合模型和算法：等离子蚀刻，LON铣削和样品中的沉积
5. Studies of the effects of fluorocarbon deposition and etching on silicon and silicon dioxide etching processes using methyl trifluoride in an inductively coupled plasma reactor, and the development of a reactive ion beam system for the study of plasma-surface interaction mechanisms. [D] . Rueger, Neal R. 1998

机译：在感应耦合等离子体反应器中研究碳氟化合物沉积和蚀刻对硅和二氧化硅蚀刻工艺的影响（使用三氟化甲基），并开发了用于研究等离子体与表面相互作用机理的反应离子束系统。
6. TuningMaterial Properties of Oxides and Nitridesby Substrate Biasing during Plasma-Enhanced Atomic Layer Depositionon Planar and 3D Substrate Topographies [O] . Tahsin Faraz, *, Harm C. M. Knoops, -1

机译：调音氧化物和氮化物的材料特性等离子体增强原子层沉积过程中的衬底偏置效应在平面和3D基板地形上
7. Modeling of Deposition During C5F8/CO/O2/Ar Plasma Etching Using Topography and Composition Simulation [O] . T. Ichikawa, T. Takase, N. Tamaoki 2015

机译：利用形貌和成分模拟建立C5F8 / CO / O2 / ar等离子体刻蚀过程中的沉积模型
8. High-Order Algorithms for 3D Plasma Simulations on Unstructured and Hybrid Meshes [R] . Karniadakis, G. E. 1999

机译：非结构化和混合网格上三维等离子体模拟的高阶算法

Coupling Models and Algorithms for 3D Topography Simulation: Plasma Etching, lon Milling and Deposition in SAMPLE-3D

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