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CMP WASTEWATER TREATMENT, PART 2

机译：CMP废水处理，第2部分

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Part 1 in this series, which appeared in the proceedings of the 2000 CMP-MIC Conference, reviewed the general aspects of CMP wastewater chemistry and treatment. The impetus for writing the review, was to draw to the reader's attention the increasing need to remediate CMP process wastewater, which is expected to double from 225 million gallons in 1998 to 450 million gallons by the year 2006. Because CMP is essential for the production of multilevel sub-0.25μm architectures, the use of CMP equipment and consumables is expected to grow at a greater rate than any other integrated circuit manufacturing equipment category. Some analysts have projected that total sales of CMP and CMP-related equipment will double from $791 million in 1998 to $1.7 billion by the year 2003, and will increase six-fold by the year 2010 to $5 billion. By the year 2000, water consumption by CMP and related processes will represent 30% to 40% of a typical fabs total water use. Of course, as more water is consumed, more wastewater is generated. To effectively meet regulatory challenges, recycling initiatives, and the safe treatment of CMP wastewater that will increasingly contain copper, it is useful to be familiar with some copper CMP wastewater chemistry and effective treatment options.
机译：该系列的第1部分出现在2000年CMP-MIC会议的会议记录中，回顾了CMP废水化学和处理的一般方面。撰写此综述的动力是引起读者的注意，对CMP工艺废水进行治理的需求不断增加，预计该废水将从1998年的2.25亿加仑增加到2006年的4.5亿加仑。翻倍。因为CMP对于生产是必不可少的在0.25μm以下的多级架构中，CMP设备和消耗品的使用预计将以比任何其他集成电路制造设备类别更高的速度增长。一些分析家预测，CMP和CMP相关设备的总销售额将从1998年的7.91亿美元增加一倍，到2003年达到17亿美元，到2010年将增长六倍，达到50亿美元。到2000年，CMP和相关工艺的用水量将占典型晶圆厂总用水量的30％至40％。当然，随着消耗更多的水，会产生更多的废水。为了有效应对法规挑战，回收计划以及将越来越多地包含铜的CMP废水的安全处理，熟悉一些CMP铜废水的化学成分和有效的处理方法很有用。

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