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首页> 外文会议>XXI International Mineral Processing Congress >CONTACT ANGLE AND THIN FILM STUDIES ON THE CATIONIC COLLECTOR/SILICA FLOTATION SYSTEM
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CONTACT ANGLE AND THIN FILM STUDIES ON THE CATIONIC COLLECTOR/SILICA FLOTATION SYSTEM

机译：阳离子集流体/二氧化硅浮选系统的接触角和薄膜研究

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Contact angles and stability measurements of aqueous thin films (containing a cationic collector; C_(14)TAB) between an air bubble and a silica substrate were determined using the microscopic methods developed by Scheludko et al. (1970, 1979). Spontaneous rupture of the thin aqueous film occurred at high contact angles and low ionic strength and was interpreted in terms of the earlier proposed electrostatic heterocoagulation mechanism of flotation. Initially, at low amine concentrations (10~(-6) M) preferential adsorption of relatively low surfactant concentrations at the bubble (vapor/solution) interface caused a net positive charge while the solution/silica interface remained negatively charged. This caused a long range (>1,000 A) electrostatic double layer attractive interaction which was sufficiently to overcome the van der Waals repulsion. Also, at higher amine concentrations, the negative charge at the solution/silica interface was reversed due to amine adsorption. Finally, on approaching the CMC (>10~(-3) M), both interfaces were sufficiently positively charged to cause the restabilization of the film by electrostatic repulsion. This study emphasizes the importance of electrostatic interactions on the cationic flotation system.
机译：使用Scheludko等人开发的显微镜方法确定气泡与二氧化硅基质之间的水性薄膜（包含阳离子集电器; C_（14）TAB）的接触角和稳定性测量值。 （1970年，1979年）。水薄膜的自发破裂在高接触角和低离子强度下发生，并且可以根据较早提出的浮选静电杂凝机理来解释。最初，在低胺浓度（10〜（-6）M）时，气泡（蒸汽/溶液）界面优先吸附相对较低的表面活性剂浓度会导致净正电荷，而溶液/二氧化硅界面仍保持负电荷。这引起了远距离（> 1,000 A）的静电双层吸引相互作用，足以克服范德华排斥力。同样，在较高的胺浓度下，由于胺的吸附，溶液/二氧化硅界面处的负电荷反转。最后，在接近CMC（> 10〜（-3）M）时，两个界面都带正电，从而通过静电排斥作用使薄膜恢复稳定。这项研究强调了阳离子浮选系统上静电相互作用的重要性。

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