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首页> 外文会议>Society of Vacuum Coaters annual technical conference >High Performance Optical Coatings Deposited Using Closed Field Magnetron Sputtering
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High Performance Optical Coatings Deposited Using Closed Field Magnetron Sputtering

机译：封闭磁场磁控溅射沉积高性能光学镀膜

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Magnetron Sputtering has many advantages over conventional evaporation processes for the deposition of oxides, transparent conductive oxides, photovoltaic layers, carbides and nitrides for various optical applications. The sputtering process is "cold", making it suitable for use on the widest range of substrates including temperature sensitive substrates and polymers. Moreover, the drum format provide more efficient loading for high throughput production. In contrast to previous reactive DC sputtering strategies the Closed Field process does not require a separate ion or plasma source for activation. Neither does it require the vacuum chamber to be separated by vacuum pumps or baffles into deposition and reaction zones. Reaction occurs on the target and all the way round the substrate carrier resulting in low absorption. The use of the Closed Field and unbalanced magnetrons creates a magnetic confinement that extends the electron mean free path leading to high ion current densities. The combination of high current densities with ion energies in the range ～30 eV creates optimum thin film growth conditions. As a result the films are dense, spectrally stable, super smooth and low stress. This paper describes results for a wide variety of deposited films and use of an optical monitor for real time deposition control.
机译：磁控溅射比常规蒸发工艺具有许多优势，可用于各种光学应用的氧化物，透明导电氧化物，光伏层，碳化物和氮化物的沉积。溅射过程是“冷的”，使其适用于最广泛的衬底，包括对温度敏感的衬底和聚合物。此外，转鼓格式可提供更有效的装载，以实现高产量的生产。与以前的反应性直流溅射策略相比，封闭场工艺不需要单独的离子或等离子体源进行激活。也不要求真空室由真空泵或挡板分隔成沉积区和反应区。反应发生在靶标上并一直围绕底物载体，导致吸收率低。封闭场和不平衡磁控管的使用产生了一种磁约束，这种磁约束扩展了电子平均自由程，从而导致了高离子电流密度。高电流密度与约30 eV范围内的离子能量的结合创造了最佳的薄膜生长条件。结果，膜是致密的，光谱稳定的，超光滑的和低应力的。本文介绍了各种沉积膜的结果以及光学监控器在实时沉积控制中的应用。

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