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首页> 外文会议>Society of Vacuum Coaters annual technical conference >AZO Coatings Deposited by Reactive HiPIMS for Modified TCO Properties on Polymeric Web
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AZO Coatings Deposited by Reactive HiPIMS for Modified TCO Properties on Polymeric Web

机译：反应性HiPIMS沉积的AZO涂层可改善聚合物网上的TCO性能

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The potential to produce coatings with much enhanced properties has made high power impulse magnetron sputtering (HiPIMS) an area of great interest with the surface engineering community in recent years. Many papers and conference presentations are coming from the academic community but, at present, industry is slow to take up the technology due to known or perceived processing issues (low deposition rates, power supply instabilities, difficulties with reactive process control, etc.)- Also, as yet, few applications have emerged to convince industry that this technology merits the significant investment required to move from lab-scale to production-scale processing. Previous work carried out by this group has shown that the thermal load experienced at the substrate is low when operating in HiPIMS mode, compared to DC and pulsed DC sputtering. It has also been seen that modifications are being made to thin film properties when produced by HiPIMS. AZO coatings have, therefore, been deposited under a variety of time averaged powers and frequencies to vary the degree of ionisation in the plasma and incident at the substrate. The coatings were then characterised in terms of their structural, optical and electrical properties using SEM, XRD, optical spectroscopy and a Hall effect probe and the interrelationships between deposition parameters and film properties were explored. A resistivity of 3.38·10~(-3) Ωcm has been achieved, with low absorption of k ~ 3.4·10~(-3), without annealing of the coating. Various coating parameter conditions have been investigated in order to further understand their influence on film properties. These coatings have simultaneously been deposited onto 12 μm PET without damage to the substrate during static deposition under stable plasma conditions.
机译：近年来，生产具有大大提高的性能的涂层的潜力已使高功率脉冲磁控溅射（HiPIMS）成为表面工程界非常感兴趣的领域。许多论文和会议演讲均来自学术界，但由于已知或可感知的处理问题（低沉积速率，电源不稳定，反应过程控制困难等），目前行业在采用该技术方面进展缓慢。而且，到目前为止，几乎没有什么应用可以说服业界相信该技术值得从实验室规模向生产规模的处理转移所需的大量投资。该小组的先前工作表明，与直流和脉冲直流溅射相比，在HiPIMS模式下工作时，基板承受的热负荷低。还已经看到，当由HiPIMS生产时，正在对薄膜性能进行修改。因此，已经在各种时间平均功率和频率下沉积了AZO涂层，以改变等离子体中和入射到基板上的离子化程度。然后使用SEM，XRD，光谱学和霍尔效应探针对涂层的结构，光学和电学性质进行表征，并探讨了沉积参数与薄膜性能之间的相互关系。电阻率达到3.38·10〜（-3）Ωcm，吸收系数低至k〜3.4·10〜（-3），且涂层未经过退火处理。为了进一步了解它们对膜性能的影响，已经研究了各种涂覆参数条件。这些涂层已同时沉积到12μmPET上，而在稳定的等离子体条件下进行静态沉积时不会损坏基材。

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