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Characteristics of Plasma Scalds in Multilayer Dielectric Films

机译:多层介电薄膜中的等离子烫伤特性

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Characteristics of plasma scalds in HfO_2/SiO_2 multilayer films are studied. The scalding behaves as surface discoloration under microscope. The shape is nearly circular when the laser incidence angle is close to normal incidence and is elliptical at oblique incidence. The nodular-ejection pit is in the center of scalding region when laser irradiates at the incidence angle close to normal incidence and in the right of the scalding region when laser irradiates from left to right at oblique incidence. The max damage size of scalding increases with laser energy. The edge of scalding is high compared with the unirradiated film surface and the region tending to the center is concave. It belongs to a surface damage. The max depth of a scald increases with its size. Tiny pits of nanometer scale can be seen in the scalding film under scan electronic microscope (SEM) at a higher magnification. Scalds don't grow during further illumination pulses until 65 J/cm~(-2).
机译:研究了HfO_2 / SiO_2多层膜中的等离子体氧化皮特性。烫伤表现为在显微镜下表面变色。当激光入射角接近法线入射时,该形状几乎为圆形,而在倾斜入射时为椭圆形。当激光以接近法线入射的入射角照射时,结节喷射坑位于烫伤区域的中心,而当激光以倾斜入射角从左向右照射时,结节喷射坑位于烫伤区域的右侧。烫伤的最大损害程度随激光能量的增加而增加。与未照射的薄膜表面相比,烫伤的边缘较高,并且趋向于中心的区域是凹入的。它属于表面损伤。烫伤的最大深度随其大小而增加。在扫描电子显微镜(SEM)下以更高的放大倍数可以在烫伤膜中看到纳米级的微小凹坑。直到65 J / cm〜(-2)以后,污垢才会在进一步的脉冲照射下生长。

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