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High Efficiency Rotatable Sputtering Targets for CIGS Thin Film Photovoltaics

机译:用于CIGS薄膜光伏的高效可旋转溅射靶

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Cu(In,Ga)(S,Se)_2 thin film photovoltaic cells show excellent potential for high cell efficiencies. Especially film deposition by sputtering technologies enables superior absorber film properties. Hence the availability of high quality sputtering targets which allow stable high rate deposition becomes a key requirement. We report on the latest developments of rotatable targets of pure In, CuGa, and CuInGa alloys. For all relevant target compositions special tubular fine-grain materials have been developed with the additional requirement to be operated at power densities well above 10 kW/m. We present sputter data from our thin film application center such as sputter rates, possible power densities and observed arcing levels. We also discuss the importance of a proper design of target microstructures for this alloy family to achieve stable sputter performance and, especially in the case of CIG alloys, a uniform film composition.
机译:Cu(In,Ga)(S,Se)_2薄膜光伏电池显示出极高的电池效率潜力。尤其是通过溅射技术进行的薄膜沉积可实现出色的吸收体薄膜性能。因此,提供稳定稳定的高速率沉积的高质量溅射靶材成为关键要求。我们报告了纯In,CuGa和CuInGa合金可旋转靶材的最新发展。对于所有相关的目标成分,已经开发了特殊的管状细颗粒材料,并附加要求以远高于10 kW / m的功率密度运行。我们提供了来自薄膜应用中心的溅射数据,例如溅射速率,可能的功率密度和观察到的电弧放电水平。我们还讨论了正确设计目标微观结构的重要性,以使该合金家族获得稳定的溅射性能,尤其是在CIG合金的情况下,必须具有均匀的膜成分。

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