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首页> 外文会议>International symposium on progress in VLSI design and test >Sensitivity and non-linearity study and performance enhancement in bossed diaphragm piezoresistive pressure sensor
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Sensitivity and non-linearity study and performance enhancement in bossed diaphragm piezoresistive pressure sensor

机译：BOSSED隔膜压阻压力传感器的敏感性和非线性研究和性能增强

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This paper describes a comparative study of sensitivity and non-linearity of conventional and bossed diaphragm piezoresistive pressure sensor along with a performance enhanced design. The proposed structures take into consideration corner compensation to avoid distortion of the mesa structure during fabrication of bossed diaphragm structure using wet bulk micromachining. Optimum piezoresistors locations are calculated with the help of simulations carried out using finite element method (FEM) based tool COMSOL Multiphysics. Since the sensitivity and non-linearity of conventional and bossed diaphragm structures showed a linear trend, empirical formulae are proposed using linear fit for quick and approximate calculation of sensitivity and non-linearity for a particular sensor structure. It is observed that high stress regions are also present near the boss - diaphragm interface and hence a design with piezoresistors placed at these regions is also proposed. This design is found to be enhancing the performance of piezoresistive pressure sensor compared to the conventional piezoresistor placement.
机译：本文介绍了常规和凸膜膜片压阻压力传感器的灵敏度和非线性的比较研究以及性能增强的设计。所提出的结构考虑到拐角补偿，以避免使用湿式散装微机械制造在制造凸膜膜结构期间MESA结构的变形。利用使用基于有限元方法（FEM）工具COMSOL多发性的模拟来计算最佳压电电阻器位置。由于常规和凸膜膜结构的灵敏度和非线性显示出线性趋势，因此使用线性拟合来提出经验公式，用于快速和近似计算特定传感器结构的灵敏度和非线性的计算。观察到，在BOSS - 隔膜界面附近也存在高应力区域，因此还提出了具有放置在这些区域的压阻器的设计。与传统压电电阻器放置相比，发现该设计增强了压阻压力传感器的性能。

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