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Simultaneous diagnostics of electron density and temperature in micoplasma reactor for scanning plasma etching

机译:用于扫描等离子体蚀刻的线粒体反应器中电子密度和温度的同时诊断

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Microplasma has been applied widely in micro fabrication. The diagnostics of microplasma generated in the scanning plasmas etching system is critical during the system operation. An experimental system is setup to investigate microplasma parameters of the dc-driven microplasmas reactor operating in CHF3 reactive gases at different gas pressure. The electron density and temperature was calculated from the optical emission spectral (OES) of the microplasmas based on Stark broadening of the Balmer lines of the hydrogen, Hβ and Hγ. The results of this paper may provide experimental verification for the optimized design of operative conditions of microplasmas reactor.
机译:微等离子体已被广泛应用于微加工中。在系统运行过程中,扫描等离子体蚀刻系统中产生的微等离子体的诊断至关重要。建立了一个实验系统,以研究在CHF 3 反应气体中在不同气压下运行的直流驱动微等离子体反应器的微等离子体参数。根据氢,H β和H γ的Balmer谱线的Stark加宽,由微等离子体的发射光谱(OES)计算电子密度和温度。本文的结果可为微等离子体反应器运行条件的优化设计提供实验验证。

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