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Atomic-scale study of scattering and electronic properties of CVD graphene grain boundaries

机译:CVD石墨烯晶界散射及电子性质的原子级研究

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Chemical vapor deposition growth of graphene on polycrystalline copper foil is a demonstrated technique for obtaining large-area, predominantly monolayer graphene. However, such growth results in grain boundaries between rotationally misoriented graphene grains. We employ scanning tunneling microscopy and spectroscopy to examine the electronic properties of grain boundaries (GBs) and scattering off them in polycrystalline graphene grown by chemical vapor deposition on Cu foil and transferred to SiO2 substrates. Spectroscopy shows enhanced empty states tunneling conductance for most of the GBs and a shift towards more n-type doping compared to the bulk of the graphene. Fourier analysis of the electronic superstructure patterns adjacent to GBs indicates that backscattering and intervalley scattering are the dominant mechanisms, leading to the mobility reduction in the presence of GBs in CVD-grown graphene
机译:石墨烯对多晶铜箔的化学气相沉积生长是获得大面积,主要是单层石墨烯的说明技术。然而,这种生长导致旋转有错误的石墨烯颗粒之间的晶界。我们采用扫描隧道显微镜和光谱学,以检查晶界(GBS)的电子性质,并通过Cu箔上的化学气相沉积在多晶石墨烯中散射它们,并转移至SiO 2底物。光谱学显示了与大部分石墨烯相比,大多数GBS的隧道电导增强了隧道电导和向更多N型掺杂的转变。与GBS相邻的电子上部结构图案的傅里叶分析表明反向散射和inchalley散射是主要机制,导致CVD-生长的石墨烯中GBS存在的迁移率降低

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