Upper roughness limitations on the TIS/RMS relationship

机译：TIS / RMS关系的上粗糙度限制

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The relationship between total integrated scatter and rms roughness was developed in the radar literature and enabled the first use of scatter measurements to monitor optical roughness. This relationship has been used and misused ever since. Its most common form makes use of a smooth surface approximation and has been applied to optical surfaces now for half a century. It has been suggested that Davies’ exponential form can be applied to much rougher surfaces. This paper investigates that issue through a combination of approximate and rigorous calculations made on optically deep sinusoidal gratings and a few measurements.© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

机译：在雷达文献中开发了总集成散射和RMS粗糙度之间的关系，并使第一次使用散点测量来监测光学粗糙度。从那以后，这种关系已经被使用并误用。其最常见的形式利用光滑的表面近似，现在已经应用于半个世纪的光学表面。有人建议戴维斯的指数形式可以应用于太多的粗糙表面。本文通过对光学深层正弦光栅的近似和严格计算的组合和几次测量来调查该问题。©（2012）照片光学仪表工程师（SPIE）的版权协会。仅供个人使用的摘要下载。

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《Conference on reflection, scattering, and diffraction from surfaces》|2012年||共7页
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John C. Stover;
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中图分类光学;
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Upper roughness limitations on the TIS/RMS relationship

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