• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>IEEE Photovoltaic Specialists Conference >Comparative study of silver nanoparticles embedded in dielectric layers for solar cell application
【24h】

Comparative study of silver nanoparticles embedded in dielectric layers for solar cell application

机译：嵌入太阳能电池介电层中的银纳米颗粒的比较研究

获取原文
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Light trapping induced by plasmonic metal nanoparticles is of extensive interest for photovoltaics. In this paper, plasmonic effect of silver nanoparticles embedded in dielectric layers hybrid structures on c-Si photoactive absorbing material is presented. Dielectric SiN and SiO layers were considered and deposited by plasma enhanced chemical vapor deposition (PECVD) and electron beam evaporation (EBE) respectively. Silver nanoparticles were prepared by annealing of thermally evaporated silver thin films ranging from 5 to 25 nm in N gas atmosphere at 260 °C for an hour. For comparative study, thicknesses of each layer including silver thin flim, SiN spacer layer and c-Si wafer were varied to attempt preliminary judgement of the appropriate structure. It is shown that reflection near bandgap of Si can be reduced while silver nanoparticles are fabricated on SiN layer and covered by SiO layer. By comparing the morphologies of nanoparticle arrays resulted from different thicknesses of silver thin film, it is indicated that nanoparticle arrays with large average sizes and high surface coverage on the front surface can greatly increase undesirable reflection in visible wavelength region in spite of their advantage in reflection reducing at longer wavelength. In addition, light trapping of the hybrid structures for varying thicknesses of SiN spacer layer and c-Si wafer were also investigated respectively. Results suggest that hybrid plasmonic structures (HPS) can play an even greater part as c-Si wafers become thinner.
机译：由等离激元金属纳米颗粒引起的光捕获对于光伏技术具有广泛的兴趣。在本文中，提出了嵌入在电介质层杂化结构中的银纳米粒子对c-Si光敏吸收材料的等离子体效应。分别考虑了电介质SiN和SiO层，并分别通过等离子体增强化学气相沉积（PECVD）和电子束蒸发（EBE）进行了沉积。通过在260°C的氮气气氛中将5至25 nm的热蒸发银薄膜退火一小时来制备银纳米颗粒。为了进行比较研究，改变了包括薄银箔，SiN隔离层和c-Si晶片在内的每一层的厚度，以尝试初步判断合适的结构。结果表明，在SiN层上制备SiO 2覆盖的银纳米颗粒时，可以减小Si带隙附近的反射。通过比较由不同厚度的银薄膜产生的纳米颗粒阵列的形貌，表明尽管具有反射优势，但平均尺寸大且正面表面覆盖率高的纳米颗粒阵列仍可以极大地增加可见波长区域中的不良反射在更长的波长处减少。此外，还分别研究了不同厚度的SiN隔离层和c-Si晶片的混合结构的光陷阱。结果表明，随着c-Si晶圆变得越来越薄，混合等离激元结构（HPS）可以发挥更大的作用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号