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Performance comparison of Si and Ge nanowire FET: A NEGF study

机译:Si和Ge纳米线FET的性能比较:NEGF研究

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The ballistic performance of Si and Ge nanowire (NW) is compared in this study. Channel length and diameter of the NW is taken to be 12 nm and 3 nm respectively. Current-Voltage characteristic is obtained by self-consistently solving the Non Equilibrium Greens Function (NEGF) transport equation with Poisson's equation. The result is obtained at <;001> channel orientation. Simulation result shows Ge NW gives higher on-state current than Si NW, when off-state current is made equal by gate metal work function engineering. However, at subthreshold region, performance of NW FET for both material is almost identical.
机译:在这项研究中比较了Si和Ge纳米线(NW)的弹道性能。 NW的沟道长度和直径分别取为12nm和3nm。通过用泊松方程自洽求解非平衡格林函数(NEGF)输运方程,可获得电流-电压特性。在<; 001>通道方向上获得结果。仿真结果表明,当通过栅极金属功函数工程使断态电流相等时,Ge NW提供的导通状态电流要比Si NW高。但是,在亚阈值区域,两种材料的NW FET的性能几乎相同。

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