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Impedance standard substrate fabricated by screen printing technology

机译:通过丝网印刷技术制造的阻抗标准基板

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The paper proposes new fabrication process for an Impedance Standard Substrate (ISS) for on-wafer measurements at microwave and millimeter-wave frequencies. Screen printing technology has provided coplanar waveguides (CPW) lines with low transmission loss and high precision contact repeatability at millimeter-wave frequency up to 110 GHz. The paper demonstrate capability of the screen printed CPW as an ISS for on-wafer measurements. Standard lines with seven different lengths were designed and fabricated by screen printing technology. In the paper, Multiline ThruReflect-Line (TRL) calibration was performed by using ISSs fabricated by both screen printing and conventional pleated technologies. Regarding calibration capability validation, contact repeatability performance was first tested, then, verification devices were measured. According to comparison results, results obtained by calibration of screen printing ISS are almost the same as results measured based on conventional ISS tech.
机译:该论文提出了一种用于在微波和毫米波频率上进行晶圆上测量的阻抗标准衬底(ISS)的新制造工艺。丝网印刷技术为共面波导(CPW)线提供了低传输损耗和在高达110 GHz的毫米波频率下具有高精度接触重复性的功能。本文演示了丝网印刷CPW作为ISS进行晶圆上测量的功能。通过丝网印刷技术设计和制造了具有七种不同长度的标准线。在本文中,通过使用丝网印刷和传统打褶技术制造的ISS进行了多线直通反射线(TRL)校准。关于校准能力验证,首先测试了触点重复性性能,然后测量了验证装置。根据比较结果,通过丝网印刷ISS校准获得的结果与基于传统ISS技术测得的结果几乎相同。

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